Advanced Micro-fabrication Equipment Inc, Shanghai

Yousen Li

Steven Tianxiao Lee

Lu Chen

Yanzhong Ma

Zhehao Chen

Chaoqian Zhang

David Zhehao Chen

A method for measuring a temperature of a film in a reaction chamber is provided. The method includes: obtaining reflectivity sampling data R of a sampling point set in a detection area of the film for light with a wavelength &#x3bb;, and thermal radiation value sampling data E of the sampling point set; obtaining a first correction factor &#x3b1; and a second correction factor &#x3b3; according to values of at least two sampling data groups, wherein 0&#x3c;&#x3b1;&#x2266;1, 0&#x2266;&#x3b3;&#x2266;1; obtaining a blackbody radiation value Lof the detection area of the film for the light with the wavelength &#x3bb; according to the first correction factor &#x3b1;, the second correction factor &#x3b3; and the values of the at least two sampling data groups; obtaining a temperature T of the detection area by looking up a table according to the blackbody radiation value Land the wavelength &#x3bb;.

Method for measuring temperature of film in reaction chamber

A method and device for determining temperature of a substrate in a vacuum processing apparatus during a process of the substrate are disclosed, the substrate to be measured is placed on a susceptor in the vacuum processing apparatus for a manufacture process, and the method includes: selecting i wavelengths from radiance emitted from the susceptor through a substrate, where i is a natural number greater than 1; obtaining at least i pieces of radiance corresponding to the selected i wavelengths; and calculating the temperature of the substrate based on the i pieces of radiance and the i wavelengths, by using a mathematical equation: E(&#x3bb;)=T(d)&#xd7;M(&#x3bb;,T), where E(&#x3bb;) is the ith radiant quantity corresponding to the ith wavelength &#x3bb;, T(d) is transmittance of the substrate, which is a function of thickness d of a film grown on the substrate, and M(&#x3bb;,T) is blackbody radiation equation, which is a function of the ith wavelength &#x3bb;and the substrate temperature T.

Method and device for measuring temperature of substrate in vacuum processing apparatus

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Shanghai, China

Yousen Li