Dalian University of Technology

Younian Wang

Yongxin Liu

Fei Gao

Kai Zhao

Zhenguo Jing

Daoman Han

Quanzhi Zhang

Yuqing Guo

Zigeng Liu

Jingyu Sun

Zixuan Su

The present disclosure relates to the field of semiconductor die etching technologies, and discloses a method for enhancing discharge in a magnetized capacitively coupled radio frequency (CCRF) discharge reactor, including: constructing a magnetized CCRF discharge reactor; and adjusting magnetic induction intensity of the magnetized CCRF discharge reactor, to enable the magnetic induction intensity to meet a relation B=(π·m)/e·f, where in the formula, B represents the magnetic induction intensity of the magnetized CCRF discharge reactor, π represents a circumference, mrepresents an electron mass, e represents an elementary charge, and frepresents an RF frequency. In the present disclosure, power coupling efficiency can be greatly enhanced, and plasma density can be greatly increased.

Method for enhancing discharge in magnetized capacitively coupled radio frequency (CCRF) discharge reactor

The present disclosure relates to a power supply system for improving plasma uniformity and a method thereof, wherein the power supply system includes a signal generating device, a first electrode and a second electrode. The signal generator is respectively connected with a plurality of signal processing circuits and is used for generating a plurality of initial signals at different frequencies; the signal processing circuits are used for processing the initial signals at corresponding frequencies; the plurality of signal processing circuits are all connected with the first electrode; and the initial signals are processed by the signal processing circuits and then act on the plasma through the first electrode. The present disclosure may effectively process signals in different power supplies, improve the stability of plasma discharge, reduce the impact of the coupling effect between different power supplies, and realize the independent control of ion flux and ion energy.

Power supply system for improving plasma uniformity and method thereof

The present invention discloses a device for measuring gas temperature in plasma, including: a vacuum chamber, a fiber optic temperature sensor, a quartz tube, a circulator, a spectrometer, a broadband light source and a computer. One end of the quartz tube is inserted into the vacuum chamber. The fiber optic temperature sensor is located in the plasma in the vacuum chamber and fixed to the quartz tube. The fiber optic temperature sensor is connected to the circulator by means of an optical fiber passing through the quartz tube. The circulator is connected to the broadband light source and the spectrometer through optical fibers, respectively. The spectrometer is electrically connected to the computer which is configured to read and record spectra collected by the spectrometer.

Method for measuring gas temperature in plasma

The present invention discloses a magnetic probe device. The magnetic probe device includes a magnetic probe body and a signal processing circuit, and an output end of the magnetic probe body is connected with an input end of the signal processing circuit; the signal processing circuit includes a first capacitor, a second capacitor, a Faraday shield and a step-up transformer, and the Faraday shield is fixedly arranged between a primary winding and a secondary winding of the step-up transformer; a center tap is arranged at the primary winding of the step-up transformer, and the center tap is grounded; and a first end of the primary winding is in series connection with the first capacitor, and a second end of the primary winding is in series connection with the second capacitor. The magnetic probe device provided by the present invention can improve the signal-to-noise ratio of a magnetic probe and the measurement accuracy of the magnetic field in plasma.

Magnetic probe device

The present invention discloses a positive and negative ion source based on radio-frequency inductively coupled discharge, comprising a tube, a middle portion of which is communicated with an intake pipe; discharge coils electrically connected to a matched network and a radio-frequency power supply successively are wound on the tube; one end of the tube is connected to a first cover plate in a sealed manner, and the first cover plate is connected with a positive ion extraction gate via an insulating medium; the positive ion extraction gate is electrically connected to a negative pole of a DC power supply; the other end of the tube is connected to a second cover plate in a sealed manner, the second cover plate is connected to a third cover plate in a sealed manner via a sidewall, and the third cover plate is connected with a negative ion extraction gate via an insulating medium; and the negative ion extraction gate is electrically connected to a positive pole of the DC power supply. In the present invention, the positive ions and the electrons and negative ions can be extracted simultaneously, and the problems of contamination of the ion source by particles sputtered from the backplane and overheating of the backplane are thus solved.

Growing community of inventors

Dalian, China

Younian Wang