Samsung Electronics Co., Ltd.

Youngkyu Park

Kijoo Hong

Kwang Soo Kim

Sungho Jang

Taejoong Kim

Juntaek Oh

Daejun Kang

Byeonghwan Jeon

Dongsuk Jung

Janggun Bae

Seungbeom Park

Changhun Lee

Seunghwa Hyun

Inshik Kang

Gwangho Lee

Jinwoo Ahn

Eunsoo Hwang

A wafer processing apparatus includes an X-θ stage unit having a rotary chuck capable of moving in an X direction and rotating in a θ direction, wherein a wafer is mounted on the rotary chuck and the wafer includes an edge portion adjacent to an edge of the wafer. In addition, the wafer processing apparatus includes: an edge bead removal (EBR) measurement and eccentricity measurement unit which is capable of inspecting a bead removal state of the edge portion of the wafer, and measuring eccentricity between the center of the rotary chuck and the center of the wafer; and an edge exposure of wafer (EEW) process unit which exposes the edge portion of the wafer after correcting the eccentricity between the center of the rotary chuck and the center of the wafer measured by the EBR measurement and eccentricity measurement unit.

Wafer processing apparatus

Various embodiments of the present disclosure relate to a device and method for controlling a communication function in an electronic device. An electronic device comprises: a wireless communication circuit for supporting first communication and second communication; memory; and at least one processor, the at least one processor configured to: check identification information about a network when connected to the network through the first communication, determine whether the network supports the second communication, on the basis of the identification information about the network and network information related to the second communication, set, on the basis of whether the network supports the second communication, whether a function, related to the second communication, of the electronic device is activated; and transmit, to the network information related to whether the function, related to the second communication, of the electronic device is activated.

Electronic device for controlling communication function, and operating method therefor

A method of inspecting a wafer comprising measuring an intensity of an incident light and storing the measurement as stored incident light intensity, irradiating the incident light to the wafer, measuring an intensity of a reflected light from the wafer and storing the measurement as stored reflected light intensity, and correcting the stored reflected light intensity based on a difference between the stored incident light intensity and a reference intensity of a reference incident light.

Method of inspecting a wafer and apparatus for performing the same

Disclosed are an apparatus for and a method of performing an inspection and metrology process. The apparatus may include a stage configured to load a substrate thereon, a sensor on the stage, an object lens between the sensor and the stage, a light source generating an illumination light to be transmitted to the substrate through the object lens, a first band filtering part between the light source and the object lens to control a wavelength of the illumination light within a first bandwidth, and a second band filtering part between the light source and the object lens to control a wavelength of the illumination light within a second bandwidth, which is smaller than the first bandwidth.

Apparatus for and method of performing inspection and metrology process

Growing community of inventors

Incheon, South Korea

Youngkyu Park