Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Youngjin Yoon

Beomsoo Kim

Jeehoon Kim

Shinhyuk Yang

Donghan Kang

Giyong Nam

Hyeonsu Cho

Eunwon Lee

Kitae Kim

Jong-Hyun Choung

Yujin Kim

Hongsick Park

Seon-Il Kim

Jongmoo Huh

In-Bae Kim

Jonghee Park

Jinseock Kim

Daesung Lim

Youngchul Park

Sangtae Kim

Kyungbo Shim

Inseol Kuk

Inho Yu

Suckjun Lee

Jihun Park

An etchant including: persulfate; a fluorine-containing compound; a chlorine-containing compound; a cyclic amine compound; an inorganic acid; a first compound; and water, wherein the first compound is a compound containing: a sulfonic group, a sulfonic acid group, or a combination thereof; and an amine group, and an interfacial permeation inhibition index (Y) of the etchant is a value of at least about 0.10 and not more than about 0.35, the interfacial permeation inhibition index (Y) being a value calculated by Equation 1. The description of Equation 1 is as in the specification.

Etchant

An etchant including: persulfate; a fluorine-containing compound; a chlorine-containing compound; a cyclic amine compound; an inorganic acid; sulfate; and water, wherein a tip control index (Y) of the etchant is a value of at least about 45.0 and not more than about 70.0, the tip control index (Y) being a value calculated by Equation 1:=1.0×10(1)+1.0×10(2)+5.0×10(3)+1.5×(1)×(2)+2.0×10(1)×(3)+2.0×10(2)×(3)  Equation 1The description of Equation 1 is as in the specification.

An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.

Etchant and method of manufacturing display device by using the same

An etchant includes, based on a total amount of the etchant, from about 0.5 to about 20 wt % of a persulfate, from about 0.01 to about 2 wt % of a fluorine compound, from about 1 to about 10 wt % of an inorganic acid, from about 0.5 to about 5 wt % of an azole compound, from about 0.1 to about 5 wt % of an electron-donating compound, from about 0.1 to about 5 wt % of a chlorine compound, from about 0.05 to about 3 wt % of a copper salt, from about 0.1 to about 10 wt % of an organic acid or an organic acid salt, and a remaining amount of water.

Etchant and method for manufacturing display device using the same

Growing community of inventors

Iksan-si, South Korea

Youngjin Yoon