Samsung Electronics Co., Ltd.

Lg Display Co., Ltd.

Youngdo Kim

Sangki Nam

Hyunchang Shin

Sungyeol Kim

Chansoo Kang

Taesung Kim

Songhee Jung

Song Hee Jung

Yongkoo Her

Sejin Oh

Daewon Kang

Jonghun Pi

Changsoon Lim

Woonbo Yeo

Sanghun Kim

Minwoo Lee

Taemin Earmme

Sungyong Lim

Jungbae Bae

Joongyu Lee

Joohyun Kim

Jaeseung Choi

Hoonseop Kim

Jung Hyun Kim

Kyungmin Lee

Kyunghyun Kim

Seungbo Shim

Hyejin Kim

Younghwan Kim

Seoyoung Lee

Juseok Lee

Sungho Jang

Dongseop Lee

Yongman Lee

Minho Jung

Vasily Pashkovskiy

Hyunjae Lee

Jin Hong Jeong

Keunsik Lee

Namhyeon Jeon

Namkyun Kim

Chanhee Park

Myunggeun Song

Changyun Lee

Dongheon Shin

Gyudong Eom

Donghyub Lee

Hunhee Lee

Hyunbae Kim

Youngduk Suh

Sungha Park

Jongsik Kang

Seongmoon Ha

Kyunjin Lee

Vladimir Vsevolodovich Protopopov

Sunghun Jang

Byungkook Cho

Hyeoncheol Jin

Zeeyoung Kang

A plasma generator may include a dielectric tube, an inner helical coil surrounding the dielectric tube and configured to generate plasma by forming a stationary wave of at least one of a magnetic field and an electromagnetic wave in the dielectric tube, a variable capacitor configuring a closed loop with the inner helical coil, an outer helical coil surrounding the inner helical coil and magnetically coupled to the inner helical coil, and a radio frequency (RF) power supply configured to provide RF power at a variable frequency to the inner helical coil.

Plasma processing device

An apparatus includes first and second VI sensors, an optical sensor, and an arcing detector. The first VI sensor is disposed in a power filter or on a power supply line connected to a heater disposed in a lower electrode of a process chamber in which a plasma process is performed. The first VI sensor senses a harmonic generated from a first power supply supplying power to the lower electrode and outputs a first signal. The optical sensor senses an intensity of light generated from the process chamber and outputs a second signal. The second VI sensor is disposed on a power supply line connected to an upper electrode and senses a harmonic generated from a second power supply supplying power to the upper electrode and outputs a third signal. The arcing detector determines whether arcing occurs based on one or more of the first, second, and third signals.

Apparatus for arcing diagnosis, plasma process equipment including the same, and arcing diagnosis method

An electronic apparatus and/or method which may improve the performance of a sensor module. An electronic apparatus may include: a display panel; a fingerprint sensor arranged to overlap at least part of the display panel; and a processor operatively connected to the display panel and the fingerprint sensor, wherein the processor may: execute a fingerprint authentication function using the fingerprint sensor; identify an AMOLED off ratio (AOR) and luminance setting value of the display panel on the basis of the fingerprint authentication function being executed; linearly adjust the AOR according to a section to which the luminance setting value belongs or set the AOR to a designated minimum value; and perform fingerprint authentication by using the fingerprint sensor while the AOR is maintained at the minimum value. The present disclosure may further include various other embodiments.

Electronic apparatus and method which may improve performance of sensor module

An electronic device and a method for driving a plurality of display areas of a display at different driving frequencies are provided. The electronic device can determine a first driving frequency of a first application, and the position of a first portion on which a first execution screen of the first application is to be displayed, determine a second driving frequency of a second application, and the position of a second portion on which a second execution screen of the second application is to be displayed, determine a third driving frequency of a third application, and the position of a third portion on which a third execution screen of the third application is to be displayed, and drive a first area of the display panel based on a first partial scan rate, and drive a second area of the display panel based on a second partial scan rate.

Electronic device for driving plurality of display areas of display at different driving frequencies

A semiconductor processing system includes: a semiconductor processing chamber including an electrostatic chuck disposed in a chamber housing, and a first power supplier for supplying first radio frequency (RF) power to an internal electrode disposed in the electrostatic chuck; a voltage measuring device for measuring a voltage corresponding to the first RF power to output a digital signal; and a control device for outputting an interlock control signal to the semiconductor processing chamber, when it is determined that the voltage increases to be within a predetermined reference range based on the digital signal. The electrostatic chuck is configured to enable a wafer to be seated on a surface of the electrostatic chuck.

System of semiconductor process and control method thereof

Various embodiments disclose a method and an apparatus including a display, a memory including information on a number of duty cycles per one refresh period for emitting light by pixels of the display corresponding to each of a plurality of refresh rates of the display, and a processor, wherein the processor is configured to control the electronic device to perform an operation according to a first number of duty cycles based on the display operating at a first refresh rate, and perform an operation according to a second number of duty cycles based on the display operating at a second refresh rate, wherein the first number is less than the second number based on the first refresh rate being higher than the second refresh rate.

Apparatus and method for driving display based on frequency operation cycle set differently according to frequency

A device for measuring a density of plasma is provided. The device includes a first sensor configured to measure a microwave spectrum of an input port reflection parameter of plasma, the first sensor having a probe including a conductive material and a flat plate shape, and a second sensor configured to measure an optical signal generated from the plasma, the second sensor being configured to detect the optical signal through the probe of the first sensor.

Device for measuring density of plasma, plasma processing system, and semiconductor device manufacturing method using the same

A diagnostic device for diagnosing distribution of a radical in a plasma processing chamber, the diagnostic device, may include a spectrometer receiving an optical signal through at least one optical channel connected to the plasma processing chamber, and performing spectral analysis on the optical signal in response to a synchronization signal corresponding to each of states of a multi-level pulse applied to the plasma processing chamber and a synchronizer generating the synchronization signal corresponding to each of the states of the multi-level pulse.

Device for radical diagnostic in plasma processing chamber, radical diagnostic system having the same, and operating method thereof

A plasma control device includes a matching circuit, a resonance circuit, and a controller. The matching circuit is connected to a first electrode of a plasma chamber including the first electrode and a second electrode, and matches impedance of a radio frequency (RF) power by an RF driving signal with an impedance of the first electrode. The RF driving signal is based on a first RF signal having a first frequency. The resonance circuit is connected between the second electrode and a ground voltage, and controls plasma distribution within the plasma chamber by providing resonance with respect to harmonics associated with the first frequency and by adjusting a ground impedance between the second electrode and the ground voltage. The controller provides the resonance circuit with a capacitance control signal associated with the resonance and switch control signals associated with the ground impedance.

Plasma control device and plasma processing system

A method of cleaning a collector of an extreme ultraviolet light source system includes introducing the collector separated from the extreme ultraviolet light source system into a chamber; capturing an optical image of a reflective surface of the collector; measuring a contamination level of the reflective surface by comparing the optical image with a prestored standard image; performing a first cleaning operation if the contamination level exceeds a preset first reference value, the first cleaning operation including cleaning the reflective surface by spraying dry ice particles onto the reflective surface; and performing a second cleaning operation if the contamination level is less than or equal to the preset first reference value. The second cleaning operation includes cleaning the reflective surface by radiating atmospheric plasma onto the reflective surface and measuring a microcontamination level and a damage level of the reflective surface.

Method of cleaning collector of EUV light source system

An electronic device may include a display panel, a display driver IC (integrated circuit) and a processor, wherein the display driver IC may set an output time (horizontal time) of one of lines constituting the display panel to a first time period, set a number of vertical blank lines for the display panel to a first number, drive the display panel at a first refresh rate corresponding to the first time period and the first number of the vertical blank lines, receive a control signal for changing from the first refresh rate to a second refresh rate from the processor, and set the output time to a second time period or set the number of the vertical blank lines to a second number and drive the display panel based on the control signal, and wherein the display panel may be driven at a second refresh rate while the second time period and the second number of vertical blank lines are being set.

Electronic device comprising display

A variable frequency and non-sinusoidal power generator includes a pulse module circuit, a slope module circuit, and first and second cooling systems. The pulse module circuit and the slope module circuit includes control switches, and generates at least one of a output currents and a output voltages by selectively turning on/off the control switches based on control signals. The first and second cooling systems are disposed at first and second sides of the control switches. A bias power having a variable frequency and a non-sinusoidal waveform is generated based on the control signals, at least one of the output currents and the output voltages.

Variable frequency and non-sinusoidal power generator using double side cooling, plasma processing apparatus including the same and method of manufacturing semiconductor device using the same

According to various embodiments, a display or an electronic device comprising the same comprises: a first layer comprising a first member; a second layer which is formed beneath the first layer, the second layer comprising a second member; and a third layer which is formed between the first layer and the second layer, the third layer comprising an adhesive member. The third layer has a first area which may be formed by using a first adhesive member having a first attribute, and a second which may be formed by using a second adhesive member having a second attribute. In addition, other various embodiments are also possible.

Display and electronic device comprising same

According to various exemplary embodiments, there may be provided an electronic device including a housing having a first area facing a first direction and a second area facing a second direction, wherein the housing includes a window formed on at least one portion of the first area, a display module disposed between the window and the second area, a light converting member disposed between the window and the second area and configured to transmit light emitted from the display module in the first direction by at least partially converting a wavelength of the light reflected in the second direction by an external object of the housing, and an optical sensor disposed between the light converting member and the second area, wherein the optical sensor is configured to detect the object by using the light of which the wavelength is converted. Other various exemplary embodiments are also possible.

Display comprising sensing function, and electronic device comprising same

Growing community of inventors

Gyeonggi-do, South Korea

Youngdo Kim