Samsung Electronics Co., Ltd.

Young-sik Park

Sung-won Choi

Yong-chul Kim

Kwang-sub Yoon

Hyun-jeong Lee

Yong-Kug Bae

Tae-sun Kim

Ji-myung Kim

Yi-Gwon Kim

Min-keun Kwak

Hee-Ho Ku

Ga-Hyun Yang

Byoung-hoon Kim

A semiconductor device includes a semiconductor substrate including an in-cell area and a scribe lane defining the in-cell area, a first overlay pattern on the semiconductor substrate, and a second overlay pattern adjacent to the first overlay pattern, wherein the first overlay pattern is a diffraction-based overlay (DBO) pattern and the second overlay pattern is a scanning electron microscope (SEM) overlay pattern.

Semiconductor device having overlay pattern

A semiconductor device includes a substrate including at least two semiconductor chip regions and a scribe lane region disposed between the semiconductor chip regions. The semiconductor device additionally includes a first optical measurement pattern disposed on the substrate. The semiconductor device further includes a second optical measurement pattern disposed on an upper layer of the first optical measurement pattern, the second optical measurement pattern being spaced apart from the first optical measurement pattern. The semiconductor device additionally includes a three-dimensional (3D) shielding structure surrounding the first optical measurement pattern and including an electrically conductive material.

Semiconductor device including an optical measurement pattern

A photomask includes a focus metrology mark region that includes a plurality of focus monitor patterns. To measure a focal variation of a feature pattern formed on a substrate, a substrate target for lithography metrology including a focus metrology mark formed on the same level as the feature pattern is used. A lithography metrology apparatus includes a projection device including a polarizer; a detection device detecting the powers of &#xb1;n-order diffracted light beams from among output beams diffracted by the focus metrology mark of a to-be-measured substrate; and a determination device which determines, from a power deviation between the &#xb1;n-order diffracted light beams, defocus experienced by the feature pattern.

Photomask including focus metrology mark, substrate target including focus monitor pattern, metrology method for lithography process, and method of manufacturing integrated circuit device

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Hwaseong-si, South Korea

Young-sik Park