Lg Display Co., Ltd.

Other

Asm Genitech Korea Ltd.

Young-Seok Choi

Ki-Sul Cho

Byung-Yong Ahn

Tae-Ung Hwang

Dong-Jun Min

Bo-Kyoung Jung

Kyo-Ho Moon

Dong-Hee Kim

Yong-Soo Cho

Chul-Tae Kim

Kyu-Sun Choi

Seung Woo Choi

Yong Min Yoo

Dae-youn Kim

Jung Soo Kim

A lateral flow atomic layer deposition device according to an exemplary embodiment of the present invention eliminates a gas flow control plate in a conventional lateral flow atomic layer deposition device and controls shapes of a gas input part and a gas output part in a reactor cover to make a gas flow path to a center of a substrate shorter than a gas flow path to an edge of the substrate and thereby increase the amount of gas per unit area flowing to the center of the substrate. Therefore, film thickness in the center of the substrate in the lateral flow reactor increases.

Lateral flow atomic layer deposition device

A method of manufacturing a substrate of a display device is disclosed. The method comprises forming a pixel electrode having a side edge that is under a patterned thermosetting insulating material layer. The method also comprises forming, from the patterned thermosetting insulating material, an insulating layer that covers the side edge of the pixel electrode by heat-treatment of the patterned thermosetting insulating material. As a result of the heat treatment of the patterned thermosetting insulating material, the patterned thermosetting insulating layer melts over the side edge of the pixel electrode.

Thin film transistor array substrate and method of manufacturing the same

A method of fabricating a fringe field switching (FFS)-liquid crystal display (LCD) device may have the following advantage. An inferior connection between the drain electrode and the pixel electrode may be prevented by preventing formation of a copper compound on the drain electrode, by performing a back channel etching after patterning a pixel electrode, and by performing a wet strip rather than a dry strip. This may result in a direct contact between copper and ITO, thereby reducing the number of mask processes.

Method of fabricating fringe field switching liquid crystal display device

Provided is an array substrate for an IPS-mode LCD device and method of fabricating the same that prevents a problem referred to as wavy noise. The IPS-mode LCD device and method have a shorter processing time and low error rate without an increase in fabrication and production costs.

Array substrate for IPS-mode LCD device being capable of preventing wavy noise

A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad, a gate electrode, and a data pad on a substrate through a first mask process, forming a gate insulating layer on a substantial part of an entire surface of the substrate including the gate line, the gate pad, the gate electrode, and the data pad, forming a data line, a source-drain pattern and an active layer on the gate insulating layer and forming a gate pad contact hole and a data pad contact hole in the gate insulating layer through a second mask process, and forming a pixel electrode, a gate pad terminal, a data pad terminal, a source electrode, a drain electrode, and an ohmic contact layer through a third mask process.

Array substrate for liquid crystal display device and fabricating method of the same

Method of fabricating array substrate for IPS-mode LCD device has a shorter processing time and low error rate without an increase in fabrication and production costs

Growing community of inventors

Daejeon, South Korea

Young-Seok Choi