Samsung Electronics Co., Ltd.

Young-Sang Lee

Woo-Jin Lee

Sang-chul Ko

Yoon-jae Lee

Woo-Kyung You

Kyoung-Woo Lee

Aran Cha

Gun-Woo Lee

Min Huh

Jung-Ouk Lim

A method for fabricating a semiconductor device includes sequentially forming an interlayer insulating layer and a hard mask pattern including a first opening on a substrate including a lower pattern, forming a trench exposing the lower pattern in the interlayer insulating layer using the hard mask pattern, forming a liner layer including a first part formed along sidewalls and a bottom surface of the trench and a second part formed along a top surface of the hard mask pattern, forming a sacrificial pattern exposing the second part of the liner layer in the trench, removing the second part of the liner layer and the hard mask pattern using the sacrificial pattern, and after the removing of the hard mask pattern, removing the sacrificial pattern to expose the first part of the liner layer.

Methods for fabricating semiconductor devices using liner layers to avoid damage to underlying patterns

The present invention relates to a call forwarding method for a web phone which connects to at least two networks and is mounted with at least two communication ports. According to the call forwarding method, if a call is received at the selective call forwarding mode, the call forwarding mode is checked. If the call forwarding mode is set, the web phone announces such to a calling party, receives a port for call forwarding from the calling party, and conducts the calling forwarding unless the port received from the calling party is not of a busy route. If the web phone is on the automatic call forwarding mode and receives a call, the phone forwards the call to a predetermined number after confirming that the predetermined port for call forwarding is not of a busy route.

Call forwarding method

Growing community of inventors

Suwon-si, South Korea

Young-Sang Lee