Samsung Electronics Co., Ltd.

Young-kwan Park

Seung-Ki Chae

Young-Tae Kim

Tai-Kyung Kim

Ui-hui Kwon

Kwang-Ho Cha

Gyeong-su Keum

Won-young Chung

Jai-hyung Won

The present invention can provide ion implanter devices including an arc chamber including at least a first inner region and a second inner region, an electron emitting device disposed in the arc chamber adjacent the first inner region and adapted to emit electrons, an electron returning device disposed in the arc chamber adjacent the second inner region and adapted to return at least some of the electrons emitted from the electron emitting device into the second inner region; and an electric field and magnetic field generating device adapted to provide a magnetic field to the arc chamber, wherein at least one inner wall of the arc chamber has a convex surface.

Ion implanters having an arc chamber that affects ion current density

Growing community of inventors

Gyeonggi-do, South Korea

Young-kwan Park