Semes Co., Ltd.

Other

Young Joon Han

Young Jin Kim

Do Gyeong Ha

Moon Soon Choi

Seung Tae Yang

Jun Gwon Lee

Tae Ho Kang

Eun Hyeok Choi

Dae Hun Kim

Proposed are a substrate processing apparatus and a substrate processing method capable of efficiently preventing contamination of a substrate and a processing space caused by a reverse flow of purge gas.

Substrate processing apparatus and substrate processing method

Disclosed is a method for treating a substrate in a plurality of chambers. The substrate treating method may include performing liquid treatment on a substrate located in a chamber through a supply line for connecting a circulation line and each of the plurality of chambers while the liquid circulates in the circulation line, wherein a flow rate per unit time of the liquid flowing downstream of a valve provided in the supply line is constantly maintained at a reference flow rate, and controlling an upstream flow rate which is a flow rate per unit time of the liquid flowing upstream of the circulation line rather than the supply lines or a downstream flow rate which is a flow rate per unit time of the liquid flowing downstream of the circulation line rather than the supply lines based on a distribution flow rate which is a flow rate per unit time of the liquid flowing upstream of the valve to maintain the reference flow rate.

Apparatus for treating substrate and method for treating substrate

Cushion device

Growing community of inventors

Cheonan-si, South Korea

Young Joon Han