Samsung Electronics Co., Ltd.

Young-hun Yu

Jin-hong Park

Joo-young Lee

Young-soh Park

Apparatus and method for measuring an aerial image whereby influences of various defects existing on patterns formed on a photomask as well as the surface of the photomask substrate can be inspected. The aerial image measuring apparatus includes an optical transmitting device, an optical reflecting device and an aerial image forming device. The optical reflecting device includes a beam splitter and a reflecting mirror. The reflecting mirror switches the path of light so that the light transmitted along the reflected light path is irradiated to the surface of the photomask on which the patterns are formed. According to an aerial image measuring method of the present invention, either transmitted light or reflected light is selected for analysis, the selected light is converted into an electrical signal to form an aerial image, and the aerial image is measured.

Apparatus and method for measuring an aerial image using transmitted light and reflected light

A method of projection exposure utilizing a mask including a step of exposing an object by utilizing a transparent mask substrate of which the upper surface is slanted at a predetermined angle from a direction perpendicular to the light path and an opaque film pattern is formed at regular intervals on a lower surface of the mask substrate so that the phase difference between adjacent mask patterns occurs due to the slanted mask substrate, thereby reducing the minimum pitch available for pattern formation without a shorter-wavelength light source and without increasing NA by reducing the frequency difference .delta.v to the pitch d of the mask in a given wavelength of a light source and NA.

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Yongin, South Korea

Young-hun Yu