Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Dongjin Semichem Co., Ltd.

Charm Engineering Co., Ltd.

Skhynix Inc.

Young Ho Seo

Keun Chan Oh

Si Heun Kim

Beom Soo Shin

Byoung Su Lee

Young Ki Han

Bong Hee Kim

Soon Wan Chung

Jae Chul Choi

June Young Hur

Chi Kug Yoon

Shi Hyun Kim

Jun Hyeok Lee

Si Hoon Youm

Hyoung Won Kim

Chan Ki Kim

Disclosed is an electronic device according to an embodiment of the disclosure that includes a battery and a battery mounting part that receives the battery therein, in which the battery mounting part includes a base and at least one side surface extending from an edge of the base and a recess area is formed in at least a partial area of the at least one side surface. Besides, it may be permissible to prepare various other embodiments speculated through the specification.

Electronic device including battery

A liquid crystal display device comprises a first substrate, a second substrate which faces the first substrate, an electrode part which is provided on at least one of the first substrate and the second substrate, and a liquid crystal layer which comprises a liquid crystal composition and is provided between the first substrate and the second substrate. The liquid crystal composition includes a liquid crystal compound of Formula 1. wherein R, R, A, A, A, A, A, Z, Z, Z, Z, Z, a, b, c, d, and e are as described herein.

Liquid crystal display device and liquid crystal composition used therefor

Provided are a plasma processing apparatus and method. The plasma processing apparatus includes a chamber, an upper electrode, a lower electrode, a substrate support, and a movement member. The upper electrode is disposed at an inner upper portion of the chamber. The lower electrode faces the upper electrode at an inner lower portion of the chamber to support a substrate such that a bevel of the substrate is exposed in a substrate level etching process. The substrate support is disposed between the upper electrode and the lower electrode to support the substrate such that a central region of a bottom surface of the substrate is exposed in a substrate backside etching process. The movement member is configured to move the substrate support to separate the substrate from the substrate support in the substrate backside etching process.

Plasma processing apparatus and method for plasma processing

Growing community of inventors

Gyeonggi-do, South Korea

Young Ho Seo