Samsung Display Co., Ltd.

Samsung Electronics Co., Ltd.

Samsung Mobile Display Co., Ltd.

Young-Gil Kwon

Jae-Ho Lee

Do-Young Kim

Mu-Hyun Kim

Nam-Choul Yang

Seong-Taek Lee

Sam-Il Kho

Young-ho Kim

Hyo-Jin Yun

Sok-Won Noh

Tae-Min Kang

Noh-Min Kwak

Myung-Won Song

Min-Chul Suh

Jae-ho Kim

Hong Joo Lee

Jin-Won Sun

Seung-Mook Lee

Sun-hee Lee

Dae-Hoon Kim

Jae-Hee Choi

Hyung-Tag Lim

Sun-Hoe Kim

Min-Soo Shin

Se-Kyung Baek

Boo-Deuk Kim

A donor substrate for transfer is disclosed. In some embodiments, the donor substrate for transfer includes a base layer, a light-heat conversion layer on the base layer, an intermediate layer on the light-heat conversion layer, and a transfer layer on the intermediate layer, in which the intermediate layer includes a transfer part and a non-transfer part, and in the transfer part and the non-transfer part, surface roughness of the intermediate layer is in a range of 30 nanometers or more and 1 micrometer or less. Methods of manufacturing an organic light emitting diode display are also disclosed.

Donor substrate for transfer and manufacturing method of organic light emitting diode display

A donor film and a thermal imaging method, the film including a base layer; a first light-to-heat conversion layer on the base layer; and a second light-to-heat conversion layer on the first light-to-heat conversion layer and to which an organic material is deposited, wherein the first light-to-heat conversion layer and the second light-to-heat conversion layer respectively absorb light of different wavelengths.

Donor film and thermal imaging method using the same

A mask for laser induced thermal imaging and a method of fabricating an organic electro-luminescence display device using the mask. A mask includes a transparent substrate including a transmitting region; a reflective layer pattern on a first surface of the transparent substrate other than the transmitting region; and a scattering unit on at least one of the first surface or a second surface opposite the first surface of the transparent substrate, and the scattering unit is at a position corresponding to the reflective layer pattern. The mask can accurately irradiate a laser to a donor substrate and prevent or reduce damage of the laser generator due to the laser beam being reflected by the mask.

Mask for laser induced thermal imaging and method of fabricating organic electro-luminescence display device using the same

A laser irradiation device and a method of fabricating an organic light emitting display device (OLED) using the same are disclosed. The laser irradiation device includes: a laser source generating a laser beam; a mask disposed below the laser source and patterning the beam and a projection lens disposed below the mask and determining magnification of the laser beam through the mask, wherein the laser beam penetrating the mask has different doses in at least two regions. Thus, the laser irradiation device can maximize emission efficiency and enhance the quality of a transfer layer pattern when an organic layer of the OLED is formed using the laser irradiation device.

Laser irradiation device and method of fabricating organic light emitting display device using the same

A flat panel display includes a thin film transistor formed on a substrate; a planarization layer formed on the thin film transistor; a first electrode layer formed on the planarization layer and electrically connected with the thin film transistor through the via hole formed in the planarization layer; a pixel definition layer formed on the planarization layer and in which an opening for at least partially exposing the first electrode layer is formed; an adhesive reinforcement layer formed at least between the planarization layer and the pixel definition layer on the top of the planarization layer; an emitting layer formed on the first electrode layer; and a second electrode layer formed on the emitting layer and the pixel definition layer. The flat panel display has an improved adhesive property between a pixel definition layer and a planarization layer, which prevents a chipping phenomenon of the pixel definition layer.

Flat panel display and method for making the same

A donor film that is easily handled in a process without adding a separate member (such as a tray) when an organic thin film is formed on a substrate by using a thermal transfer method is disclosed. In addition, a method of manufacturing the donor film and a method of manufacturing an organic light-emitting device using the donor film are disclosed. The donor film includes: a base film; a light-to-heat conversion (LTHC) layer on the base film; an interlayer on the LTHC layer and that includes a transfer region and a first protrusion corresponding to at least one edge of the LTHC layer; and a transfer layer on the interlayer and including an organic light-emitting material. A rigidity of the first protrusion is higher than a rigidity of the transfer region.

Donor film for thermal transfer, method of manufacturing the same, and method of manufacturing organic light-emitting device using the donor film

A donor substrate for a flat panel display includes a base film, a light-to-heat conversion layer on the base film, a first buffer layer on the light-to-heat conversion layer, the first buffer layer including an emission host material, a transfer layer on the first buffer layer, and a second buffer layer on the transfer layer, the second buffer layer including an emission host material identical to the emission host material of the first buffer layer.

Donor substrate for a flat panel display and method of fabricating an organic light emitting diode (OLED) display using the same

A photoresist composition includes about 4% to about 10% by weight of a photoresist resin, about 0.1% to about 0.5% by weight of a photoacid generator having a sulfonium-salt cationic group and a sulfonium-salt anionic group containing a carboxyl group as a hydrophilic site and a remainder of a solvent. The photoresist composition may form a photoresist pattern having a uniform profile.

Photoacid generators, photoresist composition including the same and method of forming pattern using the same

A photoresist film is formed on an object layer of a semiconductor device by coating the object layer with a photoresist composition including about 7 percent to about 14 percent by weight of a cyclodextrin derivative, about 0.1 percent to about 0.5 percent by weight of a photoacid generator, and a remainder of an organic solvent. The cyclodextrin derivative includes a &#x3b2;-cyclodextrin moiety and at least one alkyl carbonate group.

Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition

In a photoresist composition and a method of forming a pattern using the same, the photoresist composition includes about 0.1 to about 0.5 percent by weight of a photoacid generator including a positively charged sulfonium ion and a negatively charged sulfonate ion having a hydrophilic carboxylic group, about 4 to about 10 percent by weight of a resin, and a solvent.

Growing community of inventors

Yongin-si, South Korea

Young-Gil Kwon