Cebt Co., Ltd.

Young Chul Kim

Ho Seob Kim

Dae Wook Kim

Seung Joon Ahn

The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector () according to the present invention includes one or more deflector electrodes. Each of the deflector electrodes includes a core () made of a conductor or a semiconductor, and a coil () wound around the core ().

Magnetic deflector for an electron column

The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.

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Asan-si, South Korea

Young Chul Kim