Skhynix Inc.

Hynix Semiconductor Inc.

Young-Bang Lee

Hyung-Soon Park

Kwon Hong

Jeong-Yeop Lee

Hyung-Hwan Kim

Su-Young Kim

Ji-Hye Han

Sung-Hyuk Cho

Sung-Ki Park

Tae-Yeon Jung

Hyeong-Jin Nor

Hyo-Sang Kang

A surface treatment method for a semiconductor device includes providing a substrate where a plurality of projected patterns are formed, forming a hydrophobic coating layer on a surface of each of the plurality of projected patterns, rinsing the substrate with deionized water, and drying the substrate, wherein the hydrophobic coating layer is formed using a coating agent that includes phosphate having more than one hydrocarbon group, phosphonate having more than one hydrocarbon group, or a mixture thereof.

Surface treatment method for semiconductor device

A method for fabricating a capacitor of a semiconductor device includes sequentially forming an etch-stop layer and a mold layer over a substrate, sequentially forming a support layer and a hard mask pattern over the mold layer, forming a storage node hole by etching the support layer and the mold layer using the hard mask pattern as an etch barrier, forming a barrier layer on the sidewall of the mold layer inside the storage node hole, etching the etch-stop layer under the storage node hole, forming a storage node inside the storage node hole, and removing the hard mask pattern, the mold layer, and the barrier layer.

Method for fabricating capacitor of semiconductor device

Growing community of inventors

Gyeonggi-do, South Korea

Young-Bang Lee