Samsung Sdi Co., Inc.

Youn-Hee Nam

Hyun-Ji Song

Sung-Hwan Kim

Hea-Jung Kim

Yun-Jun Kim

Chung-Heon Lee

Hyo-Young Kwon

Joon-Young Moon

Dominea Rathwell

Seulgi Jeong

Sun-Hae Kang

Min-Soo Kim

Young-Min Kim

Sang-Kyun Kim

Ran Namgung

Yoo-Jeong Choi

Yong-Woon Yoon

You-Jung Park

Seung-Hyun Kim

Soo-Hyoun Mun

Hyeon-Il Jung

Yu-Mi Heo

Byeri Yoon

Sung-Min Kim

Mi-young Kim

Tae-ho Kim

Dong-Geun Lee

Seung-Hee Hong

Yu-Shin Park

Songse Yi

Jae-Yeol Baek

Naery Yu

Yeon-Hee Jo

Sun Young Yang

Sun-Min Hwang

Won-Jong Hwang

MyeongKoo Kim

A polymer including a moiety represented by Chemical Formula 1, an organic layer composition including the polymer, an organic layer manufactured from the organic layer composition, and a method of forming patterns using the organic layer composition are provided. The definitions of the Chemical Formula 1 are the same as defined in the detailed description.

Polymer, organic layer composition, organic layer, and method of forming patterns

A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.

Method of producing layer structure, layer structure, and method of forming patterns

A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent.*-A-B&#x2014;*&#x2003;&#x2003;[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.

Hardmask composition and method of forming patterns using the hardmask composition

A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Arto Ar, Rto R, L and m are as defined in the specification and * is a linking point. When the carbon cyclic group includes at least two hetero atoms when the carbon cyclic group includes a pentagon cyclic moiety and the pentagon cyclic moiety includes a nitrogen atom (N) as a hetero atom, and the at least two hetero atoms are the same or different: 

An organic layer composition, an organic layer, and a method of forming patterns, the composition including a polymer that includes a substituted or unsubstituted fluorene structure, an additive represented by Chemical Formula 1, and a solvent: 

Organic layer composition, organic layer, and method of forming patterns

A monomer, a polymer, an organic layer composition, an organic layer and associated methods, the monomer being represented by Chemical Formula 1: 

Monomer, polymer, organic layer composition, organic layer, and method of forming patterns

A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1: 

Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition

A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent.  In the Chemical Formula 1,

A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. In the above Chemical Formula 1, A and B are as defined in the specification.

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Suwon-si, South Korea

Youn-Hee Nam