Average Co-Inventor Count = 4.35
ph-index = 1
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Mitsubishi Gas Chemical Company, Inc. (5 from 2,248 patents)
5 patents:
1. 11572430 - Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
2. 11480877 - Resist composition, method for forming resist pattern, and polyphenol compound used therein
3. 11256170 - Compound, resist composition, and method for forming resist pattern using it
4. 11243467 - Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
5. 10642156 - Resist base material, resist composition and method for forming resist pattern