Nikon Corporation

Youhei Fujishima

Yasuhiro Omura

Koji Shigematsu

Takeshi Suzuki

Hironori Ikezawa

Miho Matsumoto

Toshiro Ishiyama

Toshihiko Ozawa

Masayuki Mizusawa

Provided is a projection optical system for forming an image of a pattern of a first object (R) on a second object (W). The projection optical system is made of an optical material having a refractive index of not more than 1.6 and is substantially telecentric both on the first object side and on the second object side. The projection optical system satisfies the condition of (&#x3bb;&#xd7;L)/(NA&#xd7;Y)&#x3c;1.5&#xd7;10, where &#x3bb; is a wavelength of light, L a distance between the first object and the second object, MA a numerical aperture on the second object side, and Ya maximum image height on the second object.

Projection optical system, exposure apparatus, and device production method

A projection optical system that projects an image on a first side onto a second plane through a plurality of lenses includes the following elements in order from the first side to the second plane: a first lens group that has a negative refractive power, a second lens group that has a positive refractive power, a third lens group that has a negative refractive power, a fourth lens group that has an aperture stop in the optical path, and a fifth lens group that has a positive refractive power. A clear aperture of a lens surface or an outer diameter of a lens in the projection optical system has a relative maximum in the second lens group, a relative minimum in the third lens group, and a relative maximum in the third-fifth lens groups, and has only one significant minimum between the first side and the second plane.

Projection optical system, a projection exposure apparatus, and a projection exposure method

A projection optical system in which an image of a first surface is projected onto a second surface based on a light beam having a predetermined wavelength. The projection optical system having at least one isometric system refractive member made of an isometric system crystal material. The isometric system crystal material transmits a light beam having the predetermined wavelength. The projection optical system also has an amorphous refractive member made of an amorphous material for compensating deterioration of optical performance due to intrinsic birefringence of the isometric system refractive member.

Production method of projection optical system

Growing community of inventors

Ageo, Japan

Youhei Fujishima