Showa Denko K.k.

Yotaro Hattori

Katsumi Murofushi

Hideo Miyata

Haruhiko Ikeda

Nobuaki Ishii

Katsutoshi Ohno

Shigeru Yamaki

Kaneo Nozawa

Yoshifumi Urakawa

Miyuki Tomita

Katsuro Urakawa

An object of the present invention is to provide a reactive urethane compound having superior curability, adhesion to substrates, transparency, molecular flexibility, and mechanical properties, a curable composition containing the compound, and a cured material formed from the composition. An ethylenically-unsaturated-group containing reactive urethane compound of the present invention is represented by formula (I): wherein Rand Rare each independently a hydrogen atom or an alkylene group; Ris a hydrogen atom, a alkyl group, or an aryl group; Ris a single bond or an alkylene group; Ris a hydrogen atom or a methyl group; Ris an oxygen atom, a sulfur atom, or an imino group; n is 2 to 12; m is 1 to 300; and X is an aliphatic, aromatic or heterocyclic compound residue.

Reactive urethane compound having ether bond, curable composition, and cured material

The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2):  

Hardening composition and hardened product thereof

It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein Ris a hydrogen atom or a methyl group, and Ris &#x2014;CO&#x2014;, &#x2014;COO&#x2014; or &#x2014;COOR&#x2014; (wherein Ris an alkylene group of 2 to 6 carbon atoms).

Thiourethane compound and photosensitive resin composition

Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond:  wherein Rand Rare each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.

Curable compositions containing hydroxythiol compound, and cured products thereof

A monomer is provided which is excellent in reactivity, can give high heat resistance and high refractive index, and has two or more polymerizable functional groups with different polymerization properties and an aromatic ring in the molecule. An industrial advantageous process for producing the monomer is also provided. The monomer is an aromatic isocyanate compound containing a (meth)acryloyl group, and is represented by Formula (I): wherein Ris a single bond or a linear or branched alkylene group of 1 to 5 carbon atoms, Ris a hydrogen atom or a methyl group, Ris a single bond or a linear or branched alkylene group of 1 to 3 carbon atoms, X is independently a halogen atom or an electron-withdrawing group, m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 3, and 1&#x2266;m+n&#x2266;5.

(Meth) acryloyl group-containing aromatic isocyanate compound and production process thereof

The present invention relates to a curable composition having high adhesiveness and transparency, comprising a thiol compound containing two or more groups represented by formula (1): wherein the symbols in the formula have the meanings as described in the specification; andan urethane compound containing an ethylenically unsaturated double bond represented by formula (2): wherein the symbols in the formula have the meanings as described in the specification.

Growing community of inventors

Kawasaki, Japan

Yotaro Hattori