Tokyo Ohka Kogyo Co., Ltd.

Yosuke Suzuki

Yuta Iwasawa

Takahiro Kojima

Tasuku Matsumiya

Masahito Yahagi

Yoichi Hori

Koshi Onishi

Tsuyoshi Nakamura

Masatoshi Arai

Yasuhiro Yoshii

Mari Murata

JunYeob Lee

A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formulae (a0-1) and one or more compounds selected from the group consisting of a compound (B01) represented by General Formula (b0-1) and a compound (B02) represented by General Formula (b0-2), Wrepresents a polymerizable group-containing group, Yarepresents a single bond or the like, Rxrepresents an acid dissociable group, Rand Rrepresents an aryl group having a fluorine atom, R, R, and Rrepresents an aryl group or the like which may have a substituent, and Xand Xrepresents a counter anion

Resist composition and method of forming resist pattern

A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1) and containing a compound (D0) represented by General Formula (d0), Wrepresents a polymerizable group-containing group, Yarepresents a single bond or the like, Rxrepresents an acid dissociable group, Mrepresents an m-valent organic cation, and Rrepresents a substituent

A resist composition including a base material component (A), an acid generator component (B), and a mixed solvent (S) in which an organic solvent (S1) represented by Formula (s1) is mixed, in which the acid generator component (B) contains a compound (B1) represented by Formula (b1). In the formula, Rrepresents an aryl group. Rand Reach independently represent an aliphatic hydrocarbon group. L, L, and Leach independently represent a divalent linking group or a single bond. Xrepresents a counter anion. Rand Reach independently represent an alkyl group having 1 to 6 carbon atoms

Resist composition and resist pattern forming method

A resist composition containing a resin component (A1) having a constitutional unit (a01) and a constitutional unit (a02) derived from compounds each represented by General Formulae (a01-1) and (a02-1), a compound (B1) represented by General Formula (b1), and a compound represented by General Formula (d1-1) or a compound represented by General Formula (d1-2), in the formulae, Crepresents a tertiary carbon atom, a carbon atom at an α-position of Cconstitutes a carbon-carbon unsaturated bond, Warepresents an aromatic hydrocarbon group, and Rbrepresents hydrocarbon group, where a fluorine atom is not contained

A resist composition that contains a base material component (A), a first acid generator, and a second acid generator, the first acid generator is a compound represented by General Formula (b1), the second acid generator is a compound (B2) having an anion moiety having a molar volume of 250 cm/mol or less, and the molar volume of the anion moiety of the compound (B2) is smaller than the molar volume of the anion moiety of the compound (B1). In the formula, Rbrepresents a specific condensed cyclic group, Ybrepresents a divalent linking group, Vbrepresents a single bond, Rcrepresents an aryl group having an electron-withdrawing group, Rc2 and Rc3 each independently represent an aryl group or are bonded to each other to form a ring together with a sulfur atom in the formula.

A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid, the resist composition containing a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (e1) in which Rdrepresents a monovalent organic group and Rdrepresents a single bond or a divalent linking group

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Kawasaki, Japan

Yosuke Suzuki