Mitsubishi Chemical Corporation

Yosuke Oseki

Akira Ohno

Yoshimasa Sakai

A mold release film, including a mold release layer formed by curing a mold release layer composition containing a curable silicone having a fluorine substituent, a curable silicone having no fluorine substituent, and a curing catalyst, on at least one surface of a substrate film. In a concentration distribution of fluorine atoms in a thickness direction within the mold release layer, fluorine atoms are unevenly distributed on a surface of the mold release layer, and a fluorine atom concentration on one side of the mold release layer is 39.0 atom concentration % or more.

Mold release film, film laminate, method for producing mold release film, and method for producing film laminate

Provided is a field-effect transistor which has a high mobility and a low variation of mobility. A field-effect transistor at least comprising a substrate, a semiconductor layer, a source electrode, and a drain electrode is produced by forming the source electrode and/or the drain electrode so that the source electrode and/or the drain electrode has a taper shape in a cross-section which is parallel with a channel length direction and perpendicular to the substrate, and forming the semiconductor layer through coating process.

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Kanagawa, Japan

Yosuke Oseki