Central Glass Company, Limited

Sony Corporation

Mitsubishi Heavy Industries Limited

Toho Tenax Co., Ltd.

Toho Tenax Europe Gmbh

Yosuke Nakamura

Tomohiro Ito

Akifumi Yao

Shunsuke Shiomi

Masaki Fujiwara

Shuhei Yoshida

Yusuke Otani

Kenji Katsumata

Kai Karikomi

Hiroyuki Oomori

Hideto Yamamoto

Tatsuo Miyazaki

Nobuyuki Tokunaga

Nobuyuki Ishizaki

Keita Nakahara

Hidekazu Yoshikawa

Ronny Wockatz

Takaaki Shibayama

Takuya Teshima

Dirk Ortmanns

Tomoyuki Hiraoka

Nobuyuki Ishizaku

Method for producing a textile unidirectional fabric, wherein at least one planar layer of multi-filament reinforcement threads arranged parallel to each other are woven with each other over transverse threads, wherein transverse threads having core-sheath structure and titer of 10 to 40 tex are used as transverse threads, wherein transverse threads have a first component, which structures sheath, and second component, which structures core, wherein first component has lower melting temperature than second component, first component is meltable thermoplastic polymer material and, via first component of transverse threads, adjacently arranged multi-filament reinforcement threads are connected to each other by hot melting, wherein alleys are formed in unidirectional fabric by interweaving multi-filament reinforcement threads together with transverse threads, by means of which a permeability of 10 to 600 l/dm2/min can be established. Preferred embodiment relates to method for producing unidirectional fabric having fleece. Further, a fiber preform, produced from unidirectional fabric.

Method for producing a textile unidirectional fabric

What is disclosed is a dry etching gas containing 1,3,3,3-tetrafluoropropene, wherein 1,3,3,3-tetrafluoropropene has purity of 99.5 mass % or more, and a total of concentration of each mixed metal component of Fe, Ni, Cr, Al, and Mo is 500 mass ppb or less. Furthermore, regarding to the dry etching gas, it is preferable that a content of nitrogen is 0.5 volume % or less, and that a content of water is 0.05 mass % or less. In a dry etching with a plasma gas obtained by making a dry etching gas into plasma, the dry etching gas of the present invention can improve etching selectivity of silicon-based material with respect to a mask.

Dry etching gas and dry etching method

A headphone includes: a headband; a pair of housing support portions, one and the other of which are provided at one and the other ends of the headband, respectively; a pair of rotational shafts, one and the other of which rotatably connect one and the other of the pair of housing support portions to the headband, respectively; a pair of housings, one and the other of which are provided on one and the other of the pair of housing support portions, respectively, wherein, in a folded state of the housing support portions as a result of a rotation, the pair of housings are disposed in positions contained within an area inside an arc formed by the headband and the housing support portions in an opened state of the housing support portions, and are located side by side without crossing each other; and a pair of ear pads.

Headphone

Disclosed is a method for refining trimethylsilane, including the steps of (1) preparing an activated carbon loaded with at least copper (II) oxide and zinc oxide; (2) adsorbing a trimethylsilane onto the activated carbon; and (3) bringing a trimethylsilane containing silane, methylsilane or dimethylsilane as an impurity into contact with the activated carbon finished with the step (2) to remove the impurity from the trimethylsilane by adsorbing the impurity. According to this method, heat generation of the activated carbon is suppressed and impurities such as dimethylsilane, etc. can be removed efficiently.

Method for refining trimethylsilane

A fluorine gas generating apparatus generating a fluorine gas by electrolyzing hydrogen fluoride in molten salt, includes: an electrolytic cell including, above a liquid level of molten salt, a first gas chamber into which a product gas mainly containing the fluorine gas generated at an anode immersed in the molten salt and a second gas chamber separated from the first gas chamber into which a byproduct gas mainly containing a hydrogen gas generated at a cathode immersed in the molten salt; a hydrogen fluoride supply source retaining hydrogen fluoride to be replenished in the electrolytic cell; a refining device trapping a hydrogen fluoride gas evaporated from the molten salt in the electrolytic cell and mixed in the product gas generated from the anode to refine the fluorine gas; and a recovery facility conveying and recovering the hydrogen fluoride trapped in the refining device in the electrolytic cell or the hydrogen fluoride supply source.

Fluorine gas generating apparatus

A method of wind tunnel measurement of airfoil, includes a step of providing a wind tunnel test apparatus. The wind tunnel test apparatus includes two walls, two supporting members, and two load measuring units. The method further includes steps of: coupling both ends of an airfoil model under test with the two supporting members, respectively; generating a flow of a fluid in the wind tunnel flow path; and measuring a load applied to the airfoil model by using the two load measuring units. A thin film member is stuck on each end of the airfoil model so that a part of the thin film member protrudes from the each end of the airfoil model along an outer circumference throughout an entire circumference. The thin film member has a strength at which the thin film member enables to endure a pressure of the fluid, and is formed of a material which is elastically deformable. The thin film member is provided so that a gap between the each end of the airfoil model and one of the two walls facing to the each end of the airfoil model is blocked.

Method of wind tunnel measurement of airfoil

Growing community of inventors

Tokyo, Japan

Yosuke Nakamura