Kurashiki Boseki Kabushiki Kaisha

Japan Atomic Energy Research Institute

Radiation Application Development Association

Yosuke Eguchi

Katsue Koashi

Shunichi Kawanishi

Tadaharu Tanaka

Masanobu Nishii

Atsuki Wada

Yuichi Shimizu

Shunichi Sugimoto

Yoshiro Hirajima

Tomohiro Nagase

Tube-shaped film having its inner peripheral surface treated, method for

A process for modifying surfaces of fluorine resins including irradiating an ultraviolet laser beam on the surfaces in the presence of an inorganic silicon compound. The inorganic silicon compound could be a silicate, silicon oxide, silicon nitride, or silicon carbide.

Process for modifying fluorine resin surfaces

An apparatus for measuring the thickness of a thin film utilizing an interferometric method includes a light source for generating a monochromatic light beam, a scanner for scanning the light beam on a thin film in such a manner that an incident angle thereto is continuously varied from .alpha. to (-.alpha.), a first detector for detecting the incident angle of the light beam and a second detector for detecting an interference pattern caused by light beams reflected from the top and bottom surfaces of the thin film. The thickness of the thin film is obtained in accordance with a geometrical optical relationship defined between adjacent fringes contained in the detected interference pattern.

Apparatus for measuring the thickness of a thin film with angle

Growing community of inventors

Takatsuki, Japan

Yosuke Eguchi