Syneron Medical Ltd.

Rosenberg, Avner

Yossef Ori Adanny

Avner Rosenberg

Baruch Levine

Genady Nahshon

Vladimir Goland

Shmulik Eisenmann

Roy Israeli

Disclosed is a system and a method for aesthetic skin treatment. The system includes an array of RF electrodes assembled on a flexible or rigid substrate. A plurality of RF voltage generators configured to address individually each of the RF electrodes of the array and supply to each pair of RF electrodes RF voltage. The amplitude of the RF voltage applied to inner pair of RF electrodes is lower than the RF voltage applied to outer pair of RF electrodes.

Skin treatment apparatus and method

An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Method and apparatus for fractional skin treatment

RF skin treatment is provided by applying to the skin an applicator that includes a tip populated by at least one voltage to skin delivering element and an isolating transformer located proximate to the tip to reduce ground currents through parasitic capacitance. The skin impedance is monitored during an RF treatment pulse to ensure that a sufficient amount of energy is delivered to the skin to cause a desired effect. The pulse energy can be increased if the skin impedance is too low. In addition, pain can be alleviated by cutting off the RF pulse if the skin impedance is too high. Further, inefficient RF pulses can be excluded by cutting off the RF energy supply if the skin impedance is too low.

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Mitzpe, Israel

Yossef Ori Adanny