Hitachi, Ltd.

Yosio Hanada

Kiyoshige Kinugawa

Satoru Ogihara

Tadashi Ishibashi

Shizuo Ishitani

Transparent conductive films produced by a series of steps comprising a coating step in which a solution obtained by dissolving an indium compound and a tin compound in an organic solvent is coated on a substrate; a preliminary drying step in which the coated substrate is dried at a temperature of 35.degree. to 100.degree. C.; a temperature rise step in which the coated substrate is heated at a temperature rise rate of 20.degree. C./min or more up to 400.degree. C. or higher; and a calcination step in which the coated substrate is calcined at a temperature of 400.degree. C. or higher, or by repeating said series of steps two or more times, have excellent properties such as strong adhesive strength to a substrate, excellent transmittance and remarkably low sheet resistance.

Process for producing transparent conductive film

A liquid crystal display element is produced by forming an electrical insulating metal oxide film on a transparent glass substrate, forming a transparent conductive film thereon by coating a coating solution prepared by diluting a solute comprising indium, tin, a .beta.-diketone and nitric acid with an organic solvent, followed by calcination, etching the transparent conductive film to give electrodes having desired patterns, placing the two resulting glass substrates in parallel so that individual electrodes at the inner side stand opposite to each other, and enclosing a liquid crystal material in the space formed between the two glass substrates. The liquid crystal display element thus produced has transparent electrodes which have low sheet resistance, enhanced mechanical strength and strong adhesive strength to the glass substrate.

Growing community of inventors

Mobara, Japan

Yosio Hanada