Sumitomo Chemical Company, Limited

Other

Yoshiyuki Takata

Yasunori Uetani

Satoshi Yamaguchi

Isao Yoshida

Hiroshi Moriuma

Yukako Harada

Yusuke Fuji

Hiroaki Fujishima

Koji Ichikawa

Satoshi Yamamoto

Kazuhiko Hashimoto

Hirotoshi Nakanishi

Takashi Hiraoka

Haruyoshi Osaki

Masahiko Shimada

Takayuki Miyagawa

Kouji Toishi

Airi Yamada

Junji Nakanishi

Yoshiko Miya

Kaoru Araki

Kunishige Edamatsu

Seong-Hyeon Kim

Soon Shin Kim

The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein Rrepresents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or &#x2014;(CH)&#x2014;CO&#x2014;X&#x2014;, k represents an integer of 1 to 4, X, X, Xand Xeach independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.

Chemically amplified positive resist composition

The present invention provides a salt represented by the formula (I): wherein P, P, P, Q, Qand R are defined in the specification and the present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

A chemically amplified resist composition comprising: (A) a salt represented by the formula (I): wherein Rrepresents a C1-C30 hydrocarbon group etc., Qand Qeach independently represent a fluorine atom etc., andArepresents at least one organic cation selected from a cation represented by the formula (Ia): wherein P, Pand Peach independently represent a C1-C30 alkyl group etc.,a cation represented by the formula (Ib): wherein Pand Peach independently represent a hydrogen atom etc., and a cation represented by the formula (Ic): wherein P, P, P, P, P, P, P, P, P, P, Pand Peach independently represent a hydrogen atom etc., B represents a sulfur or oxygen atom and m represents 0 or 1,(B) a salt represented by the formula (II):A'E&#x2003;&#x2003;(II)wherein A&#x2032;represents at least one organic cation selected from cations represented by the above-mentioned formulae (Ia), (Ib) and (Ic), and Erepresents at least one organic anion selected from an anion represented by the formula (II-1):OSQ&#x2003;&#x2003;(II-1)wherein Qrepresents a C1-C10 perfluoroalkyl group, and an anion represented by the formula (II-2): wherein Qrepresents a C1-C10 perfluoroalkyl group, and(C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

Chemically amplified resist composition

The present invention provides a chemically amplified resist composition comprising: wherein Rrepresents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one &#x2014;CH&#x2014; is substituted with &#x2014;COO&#x2014;, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and wherein Yand Yeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Arepresents an organic counter ion and Rrepresents a C1-C30 hydrocarbon group which may be substituted and at least one &#x2014;CH&#x2014; in the C1-C30 hydrocarbon group may be substituted with &#x2014;CO&#x2014; or &#x2014;O&#x2014;, and a salt represented by the formula (III):A'OS&#x2014;R&#x2003;&#x2003;(III)wherein Rrepresents a C1-C8 linear or branched chain perfluoroalkyl group and A&#x2032;represents an organic counter ion.

The present invention provides a chemically amplified resist composition comprising: wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents a methyl group, n represents an integer of 0 to 14, and Z represents a single bond or &#x2014;[CH]&#x2014;COO&#x2014;, and

The present invention provides a chemically amplified resist composition comprising a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein Rrepresents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one &#x2014;CH&#x2014; is substituted with &#x2014;COO&#x2014;, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, anda salt represented by the formula (II): wherein Yand Yeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Arepresents an organic counter ion, and Rrepresents a C1-C30 hydrocarbon group which may be substituted and at least one &#x2014;CH&#x2014; in the C1-C30 hydrocarbon group may be substituted with &#x2014;CO&#x2014; or &#x2014;O&#x2014;.

The present invention provides a salt of the formula (I): wherein X represents divalent or trivalent residue of acyclic hydrocarbon having 1 to 30 carbon atoms or divalent or trivalent residue of hydrocarbon having 3 to 30 carbon atoms which contains monocyclic or bicyclic ring, wherein &#x2014;CH&#x2014; in the hydrocarbon may be substituted with &#x2014;O&#x2014; and one or more hydrogen atom in X is optionally substituted with alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Qand Qeach independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; Arepresents organic counter ion; Y represents hydroxyl group, cyano group or methoxy group; and n shows 1 or 2. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

Salt suitable for an acid generator and a chemically amplified resist composition containing the same

The present invention provides a chemical amplification type positive resist composition comprising  

Chemical amplification type resist composition

A resin which comprises (1) at least one structural unit selected from the group consisting of a structural unit derived from 3-hydroxy-1-adamantyl (meth)acrylate, a structural unit derived from 3,5-dihydroxy-1-adamantyl (meth)acrylate, a structural unit derived from (meth)acryloyloxy-&#x3b3;-butyrolactone having a lactone ring optionally substituted by alkyl, a structural unit of the formula (Ia) and a structural unit of the formula and (2) a structural unit of the formula (II) and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and also provides a chemical amplification type positive resist composition comprising a resin defined above and an acid generator.

Chemical amplification type positive resist composition and a resin therefor

The present invention provide a chemically amplified positive resist composition comprising wherein Rand Reach independently represents a hydrogen or an alkyl having 1 to 4 carbon atoms, R, Rand Reach independently represents a hydrogen or a hydroxyl.

A resist composition excellent in balance of performance of resolution and sensitivity as well as in solubility and, particularly, suitable for use as a positive photo resist which comprises a resin having a alicyclic lactone structure unit that is insoluble in alkali by itself but becomes soluble due to the action of an acid, a solvent containing 2-heptanone and an acid generating agent, wherein a content of 2-heptanone in the solvent is in a weight ratio of from about 5 to about 95% is provided.

Chemical amplifying type positive resist composition

Positive resist composition

A chemically amplified positive resist composition capable of giving a resist film excellent in adhesion to a substrate; excellent in various resist performance characteristics such as dry etching resistance, sensitivity and resolution; and comprising a resin (X) which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali due to an action of acid, and has a polymeric unit (a) derived from 3-hydroxy-1-adamantyl(meth)acrylate and a polymeric unit (b) derived from &bgr;-(meth)acryloyloxy-&ggr;-butyrolactone wherein the lactone ring may optionally be substituted by alkyl; and an acid generating agent (Y).

Growing community of inventors

Toyonaka, Japan

Yoshiyuki Takata