Canon Kabushiki Kaisha

Yoshiyuki Kuramoto

Osamu Kakuchi

Takeshi Suzuki

Taro Tezuka

Akihiro Hatada

Naoto Hayashi

Takamasa Sasaki

Yusuke Koda

Yoshinori Ohsaki

Shinichiro Hirai

Eiji Aoki

Yuya Nishikawa

Takumi Tokimitsu

Michiko Aizawa

The present invention provides a measurement apparatus for measuring one of a position and an attitude of a measurement target, including an image sensor including one pixel unit in which a plurality of pixels adjacent to each other are arranged in a matrix and configured to capture the measurement target illuminated with a pattern light of a first wavelength and a light of a second wavelength and obtain a first image corresponding to the pattern light of the first wavelength and a second image corresponding to the light of the second wavelength, and an optical member configured to separate the pattern light of the first wavelength and the light of the second wavelength and make one of the pattern light of the first wavelength and the light of the second wavelength enter each pixel of the one pixel unit.

Measurement apparatus

A measuring apparatus for measuring a position or a shape of a surface to be inspected includes a multi-wavelength interferometer and a control unit. The multi-wavelength interferometer includes an optical system that causes light to be inspected, which enters the surface to be inspected and is reflected by the surface to be inspected, and reference light to interfere with each other, a spectroscopic unit that divides interference light between the light to be inspected and the reference light into each wavelength, and a detector that detects the interference light and is provided for each divided interference light and an optical member that can adjust a position of a light guide portion that guides light from the spectroscopic unit to the detector. The control unit controls the optical member by using information related to inclination of the surface to be inspected to adjust the position of the light guide portion.

Measuring apparatus including multi-wavelength interferometer

The present invention provides a measuring apparatus which measures a shape of an object to be measured, comprising an emitting unit configured to emit pattern light, an optical system configured to irradiate the object with the pattern light emitted from the emitting unit, a deflection unit configured to deflect light emitted from the optical system, an image sensing unit configured to sense an image of the object irradiated with the pattern light, and a processing unit configured to determine the shape of the object based on the image of the object sensed by the image sensing unit, wherein the deflection unit includes a deflection element, wherein the measuring apparatus irradiates the object with light deflected by the deflection element, and a direction deflected by the deflection element differs depending on a polarization state of incident light in the deflection element.

Shape measuring apparatus, and method of manufacturing article

A measurement apparatus comprises: a light source; a first optical system configured to reflect a certain component of a light beam emitted by the light source by a final surface thereof and transmit a remaining component of the light beam; a reflecting surface configured to reflect the remaining component; an optical member configured to generate a first shearing interference fringe formed by the certain component, and a second shearing interference fringe formed by the remaining component; an image sensing unit configured to simultaneously sense the first and second shearing interference fringes generated by the optical member; and an arithmetic unit configured to calculate, a wavefront aberration of the first optical system and a wavefront aberration of the first optical system and an optical system to be measured, using data on the first and second shearing interference fringes, thereby calculating a wavefront aberration of the optical system to be measured.

Measurement apparatus to calculate wavefront aberration of optical system using shearing interference fringes, exposure apparatus, and method of manufacturing device

A measuring apparatus includes an optical frequency comb source configured to emit an optical frequency comb in which a plurality of frequency components are arranged at equal frequency intervals, a beam splitter configured to split a beam emitted from the optical frequency comb source into a test beam to be irradiated onto a test surface and a reference beam to be irradiated onto a reference surface, an optical path difference changing element configured to change an optical path difference between the reference beam and the test beam, an image sensor configured to capture an interference pattern formed by interference between the test beam and the reference beam, and an analyzer configured to calculate a position of the test surface based upon a signal of the interference pattern captured while the optical path length difference is being changed by the optical path difference changing element.

Measuring apparatus

The present invention provides a measurement apparatus which measures a distance between a reference surface and a surface to be measured, including a wavelength reference element configured to include a gas cell in which a plurality of types of gases having absorption lines different from each other are sealed, and a processing unit configured to set a wavelength of light emitted by a light source to a plurality of different wavelengths corresponding to a plurality of different absorption lines by using the wavelength reference element, control a phase detection unit to detect a phase corresponding to an optical path length between the reference surface and the surface to be measured for each of the plurality of different wavelengths, and perform processing of obtaining the distance.

A measurement apparatus which measures a distance between a reference surface and a test surface, comprises a light source unit including a plurality of light sources each corresponding to one of a plurality of wavelength scanning ranges and each continuously scans a wavelength of generated light in the corresponding wavelength scanning range, an interferometer unit which splits light emitted by each of the plurality of light sources into reference light and test light, and detects, as an interference signal, an interference fringe formed by the reference light and the test light, and a processor which determines a slope of a phase of the interference signal with respect to wave number of the light based on the interference signal detected by the interferometer unit for each of the plurality of wavelength scanning ranges, and determines the distance from the slope of the phase.

A method of calculating a geometrical distance of a test optical path on the basis of interfering a test beam and a reference beam includes an optical-path-length calculating step of calculating an optical path length of the test optical paths having different wavelengths by using the interfering beam having mutually different wavelengths, a refractive-index calculating step of calculating the refractive index of the test optical path on the basis of the optical path length of the test optical path calculated by the optical-path-length calculating step, a smoothing step of smoothing a plurality of refractive indices acquired by repeating the optical-path-length calculating step and the refractive-index calculating step to calculate a smoothed refractive index, and a geometrical distance calculating step of calculating the geometrical distance of the test optical path on the basis of the smoothed refractive index calculated by the smoothing step.

Interferometer and distance calculation method therefor

The present invention provides a measurement apparatus which measures an imaging performance of an optical system to be measured, the apparatus including a first reference substrate which is placed on an object plane of the optical system to be measured, and has periodic patterns arranged in accordance with a plurality of object heights, a second reference substrate which is placed on an image plane of the optical system to be measured, and has apertures which pass light from the periodic patterns, a detection unit configured to detect an intensity of the light which comes from the periodic patterns and has passed through the apertures, a driving unit configured to drive at least one of the first reference substrate and the second reference substrate, and a processing unit configured to perform a process for obtaining the imaging performance of the optical system to be measured.

Measurement apparatus, exposure apparatus, and device fabrication method

An optical interferometer including, an analyzer configured to calculate an air dispersion ratio of air in the dispersion measurement interferometer excluding the component gas on the basis of a detection result of a first partial pressure detector, to calculate dispersion of air in a distance measurement interferometer from the calculated air dispersion ratio and a detection result of a second partial pressure detector, and to calculate a geometrical distance of the optical path length difference between a reference surface and a target surface.

Optical interferometer

The present invention provides a measuring apparatus for measuring an absolute distance between a reference surface an d a test surface, including a phase detection unit configured to detect an interference signal between light reflected by the reference surface and light reflected by the test surface, and detect, from the interference signal, a phase corresponding to an optical path length between the reference surface and the test surface, and a processing unit configured to perform processing of obtaining the absolute distance by controlling the phase detection unit so as to detect the phase corresponding to the optical path length between the reference surface and the test surface for each of a first reference wavelength and a second reference wavelength while changing the wavelength of light to be emitted by a first light source continuously from the first reference wavelength to the second reference wavelength.

A measurement apparatus comprises a mirror configured to reflect test light which passes through an optical system, an interferometer unit which includes an image sensor and is configured to form an interference fringe on an image sensing plane of the image sensor by reference light and the test light reflected by the mirror, and a controller configured to control the interferometer unit, and to compute a numerical aperture of the optical system based on the interference fringe captured by the image sensor, wherein the controller is configured to compute a numerical aperture NA of the optical system by multiplying a quotient &#x394;NA/&#x394;R, describing a change &#x394;NA in numerical aperture NA of the optical system with respect to a change &#x394;R in pupil radius R of the optical system in the image sensing plane, by the pupil radius R of the optical system in the image sensing plane.

Measurement apparatus, exposure apparatus, and device manufacturing method to measure numerical aperture of the optical system using interference fringe

A lightwave interference measurement apparatus includes a wavelength-variable laser which periodically performs wavelength scanning between first and second reference wavelengths to emit light beam, a wavelength-fixed laser which emits light beam having a third reference wavelength, a light beam splitting element which splits the light beams into reference light beam and light beam under test, a phase detector which detects a phase based on an interference signal of the reference light beam and the light beam under test, and an analyzer which sequentially determines an interference order of the third reference wavelength based on the third reference wavelength, first and second synthetic wavelengths, an integer component of a phase change amount in the wavelength scanning, and interference orders of the first and second synthetic wavelengths, and calculates an absolute distance between the surface under test and the reference surface.

Lightwave interference measurement apparatus that calculates absolute distance using lightwave interference

A lightwave interference measurement apparatus includes a phase detector configured to detect a phase of a signal of an interference between light from a distance-measurement light source and reflected on a reference surface and light from the distance-measurement light source and reflected on a target surface, an intensity detector configured to detect an intensity of light from a non-distance-measurement light source having a wavelength different from that of the distance-measurement light source and reflected on the reference surface and an intensity of light from the non-distance-measurement light source and reflected on the target surface, and an analyzer configured to calculate a geometric distance based on an optical path length calculated from the phase and a wavelength of the distance-measurement light source, and an average value of a vapor pressure distribution between the target surface and the reference surface calculated from intensity information of the light from the non-distance-measurement light source.

Lightwave interference measurement apparatus used to measure optical path length or distance

An optical interference measuring apparatus comprises a first multiple-wavelength light sourceemitting a light beam having a plurality of spectra, a second multiple-wavelength light sourceemitting a light beam having a wavelength different from that of the light beam from the first multiple-wavelength light source, a polarizing beam splitterseparating the light beams, a reference surfacereflecting the light beam from the second multiple-wavelength light source, a test surfacereflecting the light beam from the first multiple-wavelength light source, spectral optical elementsdividing interference signals of the light beams, detecting deviceswhich detect interference signals having single wavelengths of the light beams for a plurality of frequencies, and an analyzerprocessing the signals from the detecting devicesto calculate an optical path difference between the reference surfaceand the test surface

Growing community of inventors

Utsunomiya, Japan

Yoshiyuki Kuramoto