Nissan Chemical Industries Limited

Nissan Chemical Corporation

Yoshiyuki Kashima

Yoshitane Watanabe

Kiyomi Ema

Yutaka Ohmori

Daisuke Shimizu

Hirokazu Kato

Isao Ota

Tohru Nishimura

Tadayuki Isaji

Kenji Tanimoto

Noriyuki Takakuma

Satoru Murakami

Isao Oota

Jun-ichi Nakajima

Hiroyuki Takagi

A dispersion wherein dispersoid particles including colloidal silica and zinc cyanurate are dispersed in a liquid medium. The colloidal silica particles may have an average diameter of 5 to 500 nm, and the dispersion may contain 0.1 to 40% by mass of the particles in terms of SiOconcentration. Primary particles of the zinc cyanurate may have a major axis length of 50 to 1000 nm, a minor axis length of 10 to 300 nm, and a ratio of major to minor axis length of 2 to 25, and the dispersion may contain 0.1 to 50% by mass of the particles in terms of solids content. A mass ratio of the colloidal silica to the zinc cyanurate particles may be 1:0.01 to 100, and total solids content may be 0.1 to 50% by mass. The liquid medium may be water or an organic solvent.

Dispersion comprising colloidal silica particles and zinc cyanurate particles

A coating-forming composition for an electrical steel sheet that maintains excellent insulating properties, corrosion resistance, adhesion, and the like required in a coating for an electrical steel sheet, and exhibits excellent viscosity stability, with an increase in viscosity over time being kept gradual. A coating-forming composition for an electrical steel sheet comprises colloidal silica, a phosphate, phenylphosphonic acid or a salt thereof, and an aqueous medium.

Silica sol containing phenylphosphonic acid and applications thereof

The &#x3b2;-eucryptite fine particle production method of the invention includes spraying, into an atmosphere at 50&#xb0; C. to a temperature lower than 300&#xb0; C., a solution containing a water-soluble lithium salt, a water-soluble aluminum salt, and colloidal silica, in such amounts that the mole proportions among lithium atoms, aluminum atoms, and silicon atoms (Li:Al:Si) are adjusted to 1:1:1, to thereby dry the solution, and, subsequently, firing the dried product in air at 600 to 1,300&#xb0; C.

Method for producing &#x3b2;-eucryptite fine particles

A stable silica sol having an SiO concentration of 1 to 50% by weight and containing liquid-medium dispersed moniliform colloidal silica particles each having 3 or more as a ratio of D /D of a particle diameter (D nm) measured by a dynamic light scattering method to a mean particle diameter (a particle diameter measured by a nitrogen absorption method: D nm) where D is 50 to 500 nm, and which are comprised by spherical colloidal silica particles having a mean particle diameter of 10 to 80 nm and metal oxide-containing silica bonding these spherical-colloidal silica particles, and in which the spherical colloidal silica particles link in rows in only one plane, process for producing such and a coating composition for ink receiving layers containing such a silica sol and an ink jet recording medium.

Moniliform silica sol, process for producing the same, and ink-jet recording medium

The present invention relates to a polishing composition for polishing alumina disks, polishing substrates having silica surfaces and semiconductor wafers, comprising a stable aqueous silica sol containing moniliform colloidal silica particles having a ratio (D /D ) of a particle diameter D nm (as measured by dynamic light scattering method) to a mean particle diameter D (as measured by nitrogen absorption method) of 3 or more, wherein D is between 50 to 800 nm and D is between 10 to 120 nm, said moniliform colloidal silica particles being composed of spherical colloidal silica particles and a metal oxide-containing silica bond which bonds these spherical colloidal silica particles together, wherein the spherical colloidal silica particles are linked together in rows in only one plane by observation through an electron microscope, and further wherein said polishing composition contains 0.5 to 50% by weight of said moniliform colloidal silica particles.

Polishing composition

A process for producing a stable acidic aqueous alumina sol containing 50 to 300 nm of elongate secondary particles which are elongated in only one plane and formed by edge-to-edge coagulation of rectangular plate-like primary particles having a length of one side of 10 to 30 nm when observed through an electron microscope, the process comprises the steps of: (A) adding an alkali to an aqueous alumina sol containing fibrous colloidal particles of an amorphous alumina hydrate to produce a reaction mixture having a pH of 9 to 12, (B) subjecting the reaction mixture obtained in the step (A) to a hydrothermal treatment at a temperature of 110 to 250.degree. C. to produce an aqueous suspension containing an alumina hydrate having a boehmite structure, and (C) desalting the aqueous suspension obtained in the step (B) by adding water and an acid by ultrafiltration to form an acidic aqueous alumina sol having a pH of 3 to 6.

Process for producing an acidic aqueous alumina sol

A method for preparing a silica sol having an elongated shape comprising a step (a) where an aqueous solution containing a water-soluble calcium salt or a water-soluble magnesium salt or a mixture of the water-soluble calcium salt or the water-soluble magnesium salt is mixed with an aqueous colloidal solution of an active silicic acid; a step (b) where an alkaline substance is mixed with the aqueous liquid obtained in the step (a); a step (c) where a part or the whole of the mixture obtained in the step (b) is heated at 60.degree. C. or higher to obtain a heel solution and a feed solution is prepared by a part of the mixture obtained in the step (b) or a mixture separately prepared by the step (b) and the feed solution is added to the heel solution; and a step where water is evaporated during said addition step so that SiO.sub.2 concentration is concentrated to 6 to 30% by weight.

Method for preparing elongated-shaped silica sol

A sol of flat silica particles (100-1000 nm in size) is produced by the following steps (a) to (d) from an acidic aqueous sol (S.sub.0) of negatively charged silica particles (7-30 nm in diameter) and an aqueous solution (B) of basic aluminum or zirconium salt.

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Sodegaura, Japan

Yoshiyuki Kashima