Seiko Epson Corporation

Yoshitomo Kumai

Daisuke Sawaki

Huiping Zhang

Junichi Suzuki

Ryuta Koizumi

Junichi Wakabayashi

Hidenori Kawata

Koichiro Akasaka

Mitsutaka Ohori

Masaya Masuda

The wire grid type polarization device includes a substrate, and a metal layer formed on one face of the substrate in a substantially stripe shape in a plan view, a first dielectric layer provided on two side faces opposite to each other among a plurality of side faces of the metal layer and in a top part of the metal layer, and a second dielectric layer provided on the first dielectric layer. A substrate side end portion of the second dielectric layer is located between the one surface of the substrate and the top part of the first metal layer.The wire grid type polarization device includes a substrate and a plurality of metal layers that includes a first metal layer having a first side face, a second side face opposed to the first side face, and a top part. First and second dielectric layers are provided in the first side face, the second side face, and the top part of the first metal layer. The first dielectric layer is provided between the first metal layer and the second dielectric layer. The optical absorption rate of the first dielectric layer is less than that of the second dielectric layer.

Polarization device, method of manufacturing the same, liquid crystal device, and electronic apparatus

A projector includes an image light generator configured to modulate light emitted from a light source to generate image light, a projection optical device configured to project the image light, a polarization switching element disposed at a light exit side of the image light generator and configured to switch a polarization state of the image light emitted from the image light generator, and a controller configured to control the polarization switching element. The controller controls the polarization switching element to switch the polarization state of the image light with a predetermined period.

Projector

In a process of manufacturing a polarizing element, in a first film forming step, a metal film, a light absorption film, a hard mask, and a resist mask are sequentially formed, and then, in a patterning step, the metal film and the light absorption film are patterned to form a protruded portion provided with a light absorbing portion at a surface side of a metal portion. In a first etching step, dry etching is performed, with the light absorbing portion being an etching mask, to narrow a width of the metal portion. In a second film forming step, a silicon oxide film is formed to cover the protruded portion. In a second etching step, the dry etching is performed on the silicon oxide film, using the light absorbing portion as an etching mask, to leave the silicon oxide film at a side surface of the metal portion.

Polarizing element, liquid crystal apparatus and electronic apparatus

A display device includes a light source unit, light guide on which light from the light source unit is incident, liquid crystal panel modulating emitted light, and reflective polarizing element between the light guide and liquid crystal panel. The element includes a reflective metal portion extending in one direction and reflection enhancing portion on an end portion in the metal portion thickness direction. Light is incident on the element from an opposite side from the metal portion with respect to the reflection enhancing portion. The reflection enhancing portion includes a low refractive index film to overlap with the metal portion end portion and a high refractive index film on an opposite side of the low refractive index film from the metal portion. The high refractive index film thickness is set to an appropriate thickness corresponding to the metal portion thickness and width, and the low refractive index film thickness.

Display device and reflective polarizing element

A wire grid polarization element includes a wire grid including a plurality of wire-shaped metal layers arranged in parallel on one surface of a substrate, and a light-absorbing layer including a germanium film containing at least one of oxygen and nitrogen is provided on a side opposite to the substrate with respect to the plurality of wire-shaped metal layers. Such a germanium film can be formed by mixing an oxygen gas or a nitrogen gas into an argon gas in film formation by reactive sputtering. In this case, a flow rate of the oxygen gas or the nitrogen gas is made appropriate and thus, a complex refraction index of the germanium film is set to an appropriate value, and a reflectance with respect to linearly polarized light vibrating in an extending direction of the wire-shaped metal layers is set to 3.0% or lower.

Wire grid polarization element and electronic device

In a manufacturing process of a wire grid polarization element, a metal film, a light absorption film, and an inorganic material film for hard mask are sequentially formed, and then a resist mask is formed using nanoimprinting. Next, the metal film is patterned into a plurality of wire-shaped metal layers by dry etching. The resist mask is remaining at the bottom portion of the concave portion interposed between the adjacent convex portions. &#x394;t/P (%), which is obtained by dividing, by the pitch P (nm), the difference &#x394;t (nm) between the maximum value and the minimum value of the thickness t (nm) of the residual film of the resist mask remaining at the bottom portion of the concave portion, is rendered to be 13.4% or less.

Method of manufacturing wire grid polarization element

In a wire grid polarization element, a second light transmissing substrate is disposed on first surface side of the first light transmissing substrate on which a metallic wire grid is formed, and on the first surface of the first substrate, a recessed portion is formed in a region overlapping a region where the wire grid is formed in plan view. For this reason, it is possible to secure a space in which the wire grid is disposed between the first substrate and the second substrate without using a spacer. In addition, at the time of sealing the space in which the wire grid is disposed, the first substrate and the second substrate are bonded to each other on the outer side of the recessed portion.

Wire grid polarization element and projection type display apparatus

An optical element includes a substrate, a plurality of reflection layers disposed on one side of the substrate, an absorbing layer disposed on a side of the reflection layers that is opposite to the substrate, and an oxide film that covers the absorbing layer and portions between any two adjacent reflection layers. The reflection layers are arranged in a striped manner in plan view. The oxide film is made of an oxide of a material contained in the absorbing layer.

Optical element, method for manufacturing the same, and electronic apparatus

An optical element includes a substrate, a plurality of reflective reflection layers on the substrate, and an absorbing layer over the reflection layers. The reflection layers are arranged in a striped manner in plan view. The absorbing layer absorbs polarized light oscillating in the direction in which the reflection layers extend. The optical element also includes an oxide film on the substrate between the reflection layers and on the absorbing layer. The oxide film is formed by oxidizing the absorbing layer.

The wire grid type polarization device includes a substrate, and a metal layer formed on one face of the substrate in a substantially stripe shape in a plan view, a first dielectric layer provided on two side faces opposite to each other among a plurality of side faces of the metal layer and in a top part of the metal layer, and a second dielectric layer provided on the first dielectric layer. A substrate side end portion of the second dielectric layer is located between the one surface of the substrate and the top part of the first metal layerand a plurality of metal layers that includes a first metal layer having a first side face, a second side face opposed to the first side face, and a top part. First and second dielectric layers are provided in the first side face, the second side face, and the top part of the first metal layer. The first dielectric layer is provided between the first metal layer and the second dielectric layer. The optical absorption rate of the first dielectric layer is less than that of the second dielectric layer.

A method for producing a polarizing element includes: forming particulate materials containing a metal halide on a glass substrate; forming a protective film that covers the particulate materials in a plasma environment while reducing the metal halide constituting the particulate materials; and stretching the particulate materials by stretching the glass substrate and the protective film at a temperature at which the glass substrate is softened.

Method for producing polarizing element

A polarizer includes a first grating and a second grating. The second grating contains at least one of chromium nitride, tungsten nitride, and tantalum nitride.

Polarizer, polarizer producing process, projector, liquid crystal device, and electronic device

A method for producing a polarizing element includes: forming particulate materials of a metal halide on a glass substrate; forming a protective film that covers the particulate materials in a non-plasma environment; stretching the particulate materials by heating and stretching the glass substrate; and forming acicular metal particles by reducing the metal halide constituting the stretched particulate materials.

A polarizing element includes a plurality of first needle-shaped particles that have transmittance for first polarized light, which is in a first polarization state, that is different from transmittance for second polarized light, which is in a second polarization state different from the first polarization state, in a first wavelength region and a plurality of second needle-shaped particles that have transmittance for the first polarized light that is different from transmittance for the second polarized light, in a second wavelength region different from the first wavelength region.

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Okaya, Japan

Yoshitomo Kumai