Kabushiki Kaisha Kobe Seiko Sho

Other

Kobe Steel, Ltd.

Kobelco Research Institute, Inc.

Yoshito Fukumoto

Nobuyuki Kawakami

Takashi Kinoshita

Chitaka Manabe

Kohei Suzuki

Masakatsu Maruyama

Takeshi Nogami

Koichi Ikeda

Naoki Komai

Takayuki Hirano

Kenichi Inoue

Kazushi Hayashi

Hiroyuki Takamatsu

Katsuhiro Uehara

Shingo Sumie

In a semiconductor carrier lifetime measuring apparatus Aof the present invention, at least two types of light having mutually different wavelengths are irradiated onto a semiconductor X to be measured, a predetermined measurement wave is irradiated onto the semiconductor X to be measured, a reflected wave of the measurement wave that has been reflected by the semiconductor X to be measured or a transmitted wave of the measurement wave that has transmitted through the semiconductor X to be measured is detected, and the carrier lifetime in the semiconductor X to be measured is obtained based on the detection results so as to minimize the error. Accordingly, the semiconductor carrier lifetime measuring apparatus Aconfigured as described above can more accurately measure the carrier lifetime.

Apparatus and method for measuring semiconductor carrier lifetime

A method for manufacturing a porous dielectric substrate including patterned electrodes includes a patterned electrode-forming step of preparing a support plate having a releasable flat face and then forming the patterned electrodes on the flat face, a porous dielectric substrate-forming step of feeding a material for forming the porous dielectric substrate onto the flat face having the patterned electrodes arranged thereon to form the porous dielectric substrate in which the patterned electrodes are embedded, and a separation step of separating the support plate from the porous dielectric substrate having the patterned electrodes embedded therein. In the patterned electrode-forming step, the patterned electrodes formed on the flat face are processed to have rough surfaces in the patterned electrode-forming step. Alternatively, after the flat face is coated with a releasing agent, the patterned electrodes are formed on the resulting flat face.

Methods for manufacturing porous dielectric substrates including patterned electrodes

A dielectric line having a sufficient ensured strength and being suitable for mass production and a production method therefor are provided. The production method is a method for manufacturing a dielectric line having a dielectric strip which is provided between two conductive plates approximately parallel to each other and which has a width smaller than that of the conductive plates, and dielectric medium layers which are filled between the conductive plates other than the dielectric strip and which is composed of a porous material having a dielectric constant smaller than that of the dielectric strip. The dielectric line (NRD guide) is produced by film forming steps Sand Sin which a film of a dielectric raw material is formed on one of the conductive plates, a strip exposure step Sin which a part of the above film having a shape corresponding to the dielectric strip is exposed to predetermined light, beams, or vapor, and pore forming steps Sand Sin which the entire film of the dielectric raw material is made porous.

Dielectric line and production method therefor

A feed antenna includes a pair of conductive members, a dielectric waveguide placed therebetween, a dielectric member that is placed between the conductive members and located close to the dielectric waveguide, and a plurality of dielectric binding sections for binding the dielectric waveguide to the dielectric member. One of the conductive members has a plurality of openings.

Feed antenna including dielectric waveguide

A plurality of frequency conversion sections is provided, each of which comprises a first frequency mixer for converting the frequency of the input frequency signal by a signal from a first oscillator; a first filter for extracting an element signal from the output signal of the first frequency mixer; a second frequency mixer for converting the frequency of the output signal from the first filter by a signal from a second oscillator; and a second filter for extracting a element signal from the output signal of the second frequency mixer. The respective frequencies of the first and second oscillators are determined in accordance with a predetermined frequency setting rule specified by the relationship between the frequency conversion sections. The element signals sequentially arranged in a predetermined frequency interval can be rearranged in a desired frequency interval within a desired frequency bandwidth.

Frequency conversion apparatus

A method of forming a buried wiring comprising the steps of: (A) forming a wiring and a first insulating layer filled between the wirings on a substratum, (B) immersing the first insulating layer in a fluid which can dissolve the first insulating layer, to dissolve the first insulating layer into the fluid, (C) substituting, for the fluid, a raw material solution containing a raw material for forming a second insulating layer, without bringing the wiring into contact with a gas, and (D) filling a second insulating layer formed by gelation in the raw material solution at least between the wirings, and then, drying off the raw material solution, thereby to form the second insulating layer at least between the wirings.

Method of forming buried wiring

Method of forming buried wiring, and apparatus for processing substratum

A method for making an aerogel film includes the steps of performing a gelation reaction of a metal alkoxide on a substrate to prepare a substrate with a wet-gel film, and converting the wet-gel film into an aerogel film by a supercritical or sub-critical drying process of the substrate with the wet-gel film, wherein the degree of gelation of the wet-gel film is controlled to be a predetermined value at the start of the supercritical or sub-critical drying process. Aerogel films having uniform qualities are produced by the supercritical or sub-critical drying process in one lot.

Growing community of inventors

Kobe, Japan

Yoshito Fukumoto