Tosoh Corporation

Toyo Soda Manufacturing Co., Ltd.

Yoshitaka Tsutsumi

Toru Seita

Kousaburou Matsumura

Masazumi Hasegawa

Hideo Shuyama

Kyoko Nakazawa

Takashi Yamamoto

Tadashi Hayashi

Kyoko Nagaoka

Takeshi Hironaka

Toshimitsu Yanagihara

Teruhisa Uemura

Mitsumasa Akashi

Kosaburo Matsumura

A planarizing material comprising a resin capable of having its practical temperature for a planarizing step set at a level lower than 200.degree. C., and a melamine-type heat-curing agent and/or an epoxy-type heat-curing agent.

Planarizing material and planarizing method

A chloroprene rubber having a shade of white only slightly tinged with pale yellow and exhibiting good tackiness is prepared by an aqueous radical emulsion polymerization of chloroprene or a mixture comprised of chloroprene and a copolymerizable monomer, wherein the polymerization is effected by using an alkali metal salt of a disproportioned rosin acid as an emulsifier, and a water-soluble polymeric substance as a dispersion stabilizer which has a sulfonic acid group and/or sulfate ester groups, which group has been introduced by an addition polymerization procedure or by a procedure of a polymeric reaction following an addition polymerization.

Process for producing chloroprene rubber

A positive photosensitive composition for forming lenses, which comprises a polymer, a photosensitive agent, a thermosetting agent and a solvent, wherein said polymer is an alkali-soluble resin, said photosensitive agent is a 1,2-naphthoquinone diazide sulfonate, and said thermosetting agent is a thermosetting agent capable of imparting heat resistance and solvent resistance at the time of forming lenses by heat treatment.

Positive photosensitive composition for forming lenses containing

Positive resist patterns prepared by using a derivative of polyacrylic acid esters containing halogen expressed by the following general formula for the resist material; ##STR1## (where A is a structural unit which is derived from monomers having a copolymerable double bond, and X is either a halogen atom or a methyl group. m is a positive integer, n is 0 or a positive integer, n/m is 0 to 2 and m+n are 20 to 20,000. Y.sub.1 to Y.sub.5 are a fluorine or hydrogen atom and at least one of them is a fluorine atom).

Positive resist patterns

Halogen-containing polyacrylate derivatives having the formula: ##STR1## wherein A is a structural unit derived from a copolymeriazable monomer having a double bond; R is ##STR2## wherein each of R.sub.1 and R.sub.2 is a hydrogen atom or a fluorinated methyl group, provided R.sub.1 and R.sub.2 are not hydrogen atoms at the same time, and R.sub.3 is a hydrogen atom or a lower alkyl group; X is a halogen atom or a methyl group; and m is a positive integer, n is 0 or a positive integer, and n/m from 0 to 2, preferably from 0 to 1 are disclosed. Also disclosed are methods for forming a resist pattern by using the halogen-containing polyacrylate derivatives as a resist material.

A method of image-wise exposing and developing halogen-containing

A halogen-containing polyacrylate derivative having the formula: ##STR1## wherein A is a structural unit derived from a copolymerizable monomer having a double bond; R is ##STR2## wherein each of R.sub.1 and R.sub.2 is a hydrogen atom or a fluorinated methyl group, provided R.sub.1 and R.sub.2 are not hydrogen atoms at the same time, and R.sub.3 is a hydrogen atom or a lower alkyl group; X is a halogen atom or a methyl group; and m is a positive integer, n is 0 or a positive integer, and n/m is from 0 to 2, preferably from 0 to 1.

Growing community of inventors

Kudamatsu, Japan

Yoshitaka Tsutsumi