Asahi Glass Company, Limited

Agc Inc.

Yoshitaka Saijo

Yusuke Kobayashi

Yuichi Suzuki

Junichiro Kase

Takahiro Sakagami

Atsuyoshi Takenaka

Aya Yamamoto

Ryoji Akiyama

Mitsuru Wakatsuki

A transparent substrate having an antiglare function includes first and second faces. The transparent substrate has a resolution index value T, a reflected image diffusivity index value R, and a sparkle index value S satisfying T&#x2265;0.25, R&#x2265;0.8, and 0.75&#x2264;S&#x2264;0.95, respectively. The resolution index value T is calculated as (luminance of zero-degrees transmission light)/(luminance of total transmission light). The reflected image diffusivity index value R is calculated as (R+R)/(2&#xd7;R), where Rdenotes a luminance of reflected light reflected at first angle &#x3b1;, and R, Rdenote luminance of reflected light at the second angle &#x3b1;, the third angle &#x3b1;, respectively, with respect to the first angle &#x3b1;. The sparkle index value S is calculated as 1&#x2212;(S/S), where the first sparkle Sand the second sparkle Sdenote a sparkle value of the transparent substrate and a sparkle value of a glass substrate, respectively.

Transparent substrate

A colored glass, a surface of which is roughened in whole or in part. In the colored glass, an average value of gloss values measured at 9 points in the surface thereof at an incident angle of 60&#xb0; in accordance with JIS 28741 (1991) is 30 or less, a ratio of a difference between a maximum gloss value and a minimum gloss value to the maximum gloss value is 20% or less, and a minimum value of visible-light transmittance at a thickness of 0.8 mm is 70% or less.

Colored glass

The invention provides a method for etching which is intended for reducing the thickness of a glass substrate, and which attains a high etching rate and is capable of inhibiting haze generation on the glass substrate surface. The invention relates to a method for etching a glass substrate surface, comprising etching the glass substrate surface in an amount of 1-690 &#x3bc;m in terms of etching amount, in which the etching is conducted with an etchant having an HF concentration of 1-5 wt % and an HCl concentration of 1 wt % or higher.

Method for etching glass substrate

Growing community of inventors

Tokyo, Japan

Yoshitaka Saijo