Koa Corporation

Yoshitaka Kumeda

Tadahiko Yoshioka

Naoki Kanauchi

Reina Kaneko

Provided is a copper-manganese-nickel based alloy having characteristics (in particular, specific resistance) close to those of a nickel-chromium based alloy. It is also an objective to provide an alloy having high processability compared to a nickel-chromium based alloy. An alloy for a resistive body includes copper, manganese, and nickel, wherein the manganese is 33 to 38% by mass, and the nickel is 8 to 15% by mass.

Alloy for resistor and use of resistor alloy in resistor

Provided is a resistance alloy enabling a decrease in the TCR of a shunt resistor for use in a current detection device capable of detecting large currents. A copper-manganese based resistance alloy for use in a shunt resistor further comprises tin and nickel and has a TCR less than or equal to −36×10/K at 100° C. with reference to 25° C.

Resistance alloy for use in shunt resistor, use of resistance alloy in shunt resistor, and shunt resistor using resistance alloy

Provided is a current detection resistor, such as a shunt resistor, wherein a. low specific resistance and a small thermal electromotive force with respect to copper are achieved, while maintaining a low TCR. A resistance alloy for use in a current detection shunt resistor includes 4.5 to 5.5 mass % of manganese, 0.05 to 0.30 mass % of silicon, 0.10 to 0.30 mass % of iron, and a balance being copper, and has a specific resistance of 15 to 25 μΩ·m.

The resistive material contains copper and manganese, an oxide film of manganese being formed on a surface of the resistive material.

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Nagano, Japan

Yoshitaka Kumeda