Panasonic Liquid Crystal Display Co., Ltd.

Hitachi Displays, Ltd.

Yoshitaka Imabayashi

Akira Ishii

Ryuuta Watanabe

Yoshihiro Daito

A nozzle is moved while supplying a photoresist liquid from a slit. A photoresist layer is formed on a film. A resist pattern which covers a portion of the film is formed from the photoresist layer by photolithography. Inspection of the resist pattern is performed. The photolithography includes an exposure which is performed so as to transfer a latent image to the photoresist layer, and a development of the photoresist layer which is performed so as to leave the latent image. The latent image contains a dummy latent image which extends in an unbroken manner parallel to the longitudinal direction of the slit. The resist pattern contains a dummy resist formed correspondingly to the dummy latent image. The inspection of the resist pattern includes the detection of the presence or non-presence of a cut in the dummy resist in the longitudinal direction.

Inspection method for patterning of photoresist

In a liquid crystal display device having a pair of substrates that are opposite to and bonded to each other, a liquid crystal layer is sealed between the pair of substrates, and columnar spacers are formed on one of the pair of substrates and in contact with the other substrate to maintain a gap between the pair of substrates. The surfaces of support columns of the columnar spacers are made to be rough to enhance the friction force between the pair of substrates and to prevent the other of the pair of substrates from diverging from the one of the pair of substrates, so that display quality of the liquid crystal display device is improved.

Growing community of inventors

Mobara, Japan

Yoshitaka Imabayashi