Hitachi, Ltd.

Renesas Technology Corp.

Other

Hitachi-high-technologies Corporation

Hitachi Displays, Ltd.

Yoshitada Oshida

Masataka Shiba

Minori Noguchi

Makoto Murayama

Yukio Kenbo

Yasuhiro Yoshitaka

Toshihiko Nakata

Yasuhiro Yoshitake

Naoto Nakashima

Kenji Yasuda

Satoshi Takahashi

Taisaku Seino

Sachio Uto

Koji Suzuki

Tetsuzo Tanimoto

Minoru Yoshida

Yukihiro Shibata

Toshiei Kurosaki

Yasuo Nakagawa

Yasuhiko Nakayama

Tomoaki Sakata

Takeshi Maeda

Hideaki Tanaka

Noboru Kunimatsu

Hiroyuki Takahashi

Takeshi Kato

Masahiro Watanabe

Tsuneo Terasawa

Yoshito Tsunoda

Masahiro Aoki

Tsutomu Tanaka

Nobuyuki Akiyama

Taku Ninomiya

Mitsuyoshi Koizumi

Ryuichi Funatsu

Hiroshi Makihira

Hidemi Sato

Akira Inagaki

Hisafumi Iwata

Soichi Katagiri

Takao Terabayashi

Toshio Kaneko

Tatsuo Teraoka

Shuji Sugiyama

Satoru Kikuchi

Genya Matsuoka

Katsuhiro Kawasaki

Atsuhiro Yoshizaki

Noboru Umehara

Hiroyoshi Ando

Hidenori Yamaguchi

Nobuhiko Aoki

Teruo Iwasaki

Susumu Sawano

Kanji Ishige

Hiroshi Makihara

Yoshimitsu Saze

Yoshihiko Aiba

Tutomu Tawa

Aki Sakai

Shigemi Ishii

Kenichirou Fukuda

Yoichi Kawata

Shinobu Watanabe

Kenichi Isoda

A DNA inspecting apparatus including driving means for relatively changing positions of the multi-spot lights and a position of the DNA chip so as to detect the fluorescent lights in such a manner that a desired area on the DNA chip is irradiated with the multi-spot lights, and a control system for determining and inspecting DNA information about the to-be-inspected DNA chip from fluorescent light intensities and fluorescent light positions of the desired area on the DNA chip, the fluorescent light intensities and the fluorescent light positions being detected by the driving means and the fluorescent light detecting means.

Method of inspecting a DNA chip and apparatus thereof

A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing the light pattern is formed by illuminating a mask with excimer laser light having an annular shape.

Exposure apparatus and method

A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device through an object lens, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing, the light pattern projected on the substrate is formed by excimer laser light which is emitted from an annular shaped light source and which is passed through a mask having a phase shifter.

A fluorescent or luminescence image of at least part of a biological sample is imaged, then a transmission light image of at least part of the biological sample is imaged, and thereafter the fluorescent or luminescence image and the transmission light image are overlaid such that the identical area of the sample is coincided to display. The present invention allows detecting the accurate location of fluorescence or luminescence in a given part of the biological sample.

Biological sample optical measuring method and biological sample optical measuring apparatus

A method and apparatus of stably obtaining fluorescent images of two or more fluorescent samples includes disposing the samples onto compartments defined on a substrate. The compartments are sequentially irradiated with an exciting light where the intensity varies. A value of fluorescence as generated from each of the samples is determined, and a fluorescent image is obtained based on the value of fluorescence.

Method in inspecting DNA and apparatus therefor

A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a first light pattern on the substrate of the semiconductor device the first light pattern being formed by passing light through a first mask, and exposing the resist by projecting a second light pattern on the substrate, the second light pattern being formed by passing light through a second mask. In the step of exposing the resist by projecting the second light pattern, the second light pattern is formed by excimer laser light having an annular shape and passed through the second mask.

A method of inspecting a DNA chip and an apparatus therefor that allow a picture to be reconstructed in the following steps: A plurality of irradiation spots are formed on a DNA probe array mounted on a stage. Then, the stage is displaced in X, Y directions so as to execute a scanning, thereby irradiating substantially all the entire surface of the DNA probe array. Next, a plurality of emitted fluorescent lights, which are generated from the plurality of irradiation spot portions on the DNA probe array, are converged and are then detected simultaneously by multi detectors. Finally, a data processing apparatus processes the detected signals, thereby reconstructing the picture.

Method of inspecting a DNA chip

It is possible to enhance the utilization efficiency of a light source and impart an orientation control performance and a pretilt angle to an orientation film in a short treatment time. Substrates to which orientation films are applied are mounted on stages which are sequentially transported to a main irradiation region and a sub-irradiation region. Light flux irradiated from a light source device having a single light source receives polarization treatment at a polarization unit, thus generating main polarized light and sub-polarized light. The main polarized light is irradiated to the orientation film formed on the substrate which is transported to a main irradiation region, thus imparting orientation control performance to the orientation film. Subsequently, the substrate is transported to a sub-irradiation region, and sub-polarized light is irradiated to the orientation film to which orientation control performance is already imparted, thus imparting a pretilt angle to the orientation film.

Method and apparatus for imparting alignment to alignment layer through generation of two kinds of polarized light from a single light source and treatment with both

Disclosed is an apparatus for measuring a micro area in a specimen in which a reagent necessary for observation and examination of a cell smear specimen or a tissue specimen is dropped to cause a reaction for a measurement and an analysis by way of an image. The apparatus includes: a micro reaction unit that is able to select a specific micro area in the specimen and to subject the specific micro area to a reaction-operation; a unit that measures; records and displays an image of the micro area; and a control unit that controls the measuring, recording, and displaying unit. Reactions can be effected quickly on such specimens as smear cell specimens and tissue slice specimens. The application of the reagent solution can be saved. A comparison between local presence of a gene or anti-body and a cell image can be made quickly and easily.

Apparatus and method for measuring micro area in specimen

An apparatus and method for projecting a pattern includes a light source for emitting a laser; an illuminating unit which illuminates a mask on which a pattern is formed with the laser emitted from the light source and formed in a particular shape; a holder which holds the mask; an optical lens unit which projects the pattern formed on the mask onto a surface of a substrate by the laser illuminated on the mask; and a table which mounts the substrate and moves in at least one direction.

A DNA sample added with a plurality of fluorescent marks is irradiated with excitation lights having a plurality of wavelengths and when fluorescence intensities are detected separately, the excitation light and a position on the sample are relatively changed over a desired area once to thereby detect the plurality of fluorescent marks at high speed.

Method and apparatus for inspecting DNA and method for detecting fluorescence

A production method of a semiconductor device, includes the steps of emitting an excimer laser from a light source, illuminating a pattern on a mask with the excimer laser emitted from the light source and passed through a filter, exposing a resist on a substrate of the semiconductor with the excimer laser passed through the mask, and forming a pattern on the substrate in accordance with a portion of the resist exposed with the excimer laser.

An optical assembly has a substrate and an optical device chip. On mutually opposed surfaces of the optical device chip and the substrate, indexes having slope faces are formed. Index passage alignment is performed by using the indexes as positioning reference and by using image measurement.

Alignment of an optical assembly

A production method of a semiconductor device, includes the steps of emitting an excimer laser from a light source, forming the excimer laser in a particular shape, illuminating a pattern on a mask for a phase shifter method with the particular shaped excimer laser, and exposing a resist on a wafer with the excimer laser which passed through the mask. The resist on the wafer is developed and the wafer is etched to form a pattern.

A projection exposure apparatus (1) comprises an incident light optical system for causing the light emitted from a light source 1 to enter an object of exposure (4) in diagonal direction, a detection apparatus (3) for causing an interference between the light reflected from the object of exposure (4) and a reference light and detecting the resultant interference fringe, a processing circuit for determining the inclination and height of the surface of the object of exposure (4) from the optical information on the interference fringe, and a stage (7) for supporting the object of exposure (4). The object of exposure (4) is subjected to projection exposure by driving the stage (7) according to the calculated inclination and height of the object of exposure (4).

Projection exposure apparatus and projection exposure method

Growing community of inventors

Fujisawa, Japan

Yoshitada Oshida