Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Yoshisada Ebata

Takanori Aono

Shigeru Matsui

Kenta Yaegashi

Tetsuya Watanabe

Norio Hasegawa

Isao Uchida

Naoya Nakai

Yugo Onoda

Jiro Yamamoto

Toshihiko Onozuka

Kazuyuki Kakuta

The present invention provides a concave diffraction grating and an optical device using the concave diffraction grating, the concave diffraction grating being capable of preventing deformation of a reflection film due to the influence of temperature, and preventing deterioration in optical characteristic due to temperature. This concave diffraction grating is provided with: a reflection film () having a plurality of grating grooves (); a holding film () comprising metal and having one surface on which the reflection film () is provided; a concave substrate () having a concave surface (); and an affixing layer () provided between the concave surface () and the other surface of the holding film (), and affixing the holding film () and the reflection film () to the concave substrate ().

Concave diffraction grating and optical device

An objective of the present invention is to improve a diffraction grating. A molding member including a substrate and a resist pattern having a surface shape including grooves is prepared. The grooves include bottom portions BPand top portions TPthat are alternately repeated in an X direction, and that each extend in a Y direction. The bottom portions adjacent to each other have an interval that changes stepwise. Next, a metal film is formed on a surface of the resist pattern to cover the grooves, and then the metal film is peeled off from the molding member. As a result, the metal film is formed to have a surface shape reverse to the surface shape of the resist pattern is formed. Top portions TPand bottom portions BPof the metal film correspond to bottom portions BPand top portions TPof the resist pattern respectively.

Diffraction grating, method for manufacturing diffraction grating, and photomask

Easy and accurate mating of a groove interval of a groove pattern of a diffraction grating with a position on a convex fixing substrate is enabled. For this purpose, a concave diffraction grating is fabricated by: transferring a groove pattern formed on a plane diffraction grating and having unequal groove intervals onto a metal thin film; forming a first alignment mark on a convex surface of a fixing substrate having the convex surface to fix the metal thin film; mating a second alignment mark formed on an adhesive surface of the metal thin film with the first alignment mark to perform alignment; bonding the adhesive surface of the metal thin film and the convex surface of the fixing substrate to each other to fabricate a master; and transferring a groove pattern of a metal thin film of the master.

Manufacturing method of concave diffraction grating, concave diffraction grating, and analyzer using the same

The present invention provides a concave diffraction grating capable of improved diffraction efficiency by suppressing spherical aberration. The concave diffraction grating is a concave diffraction gratingfor dispersing and focusing light and comprises sawtooth grating grooveson a concave substrate, with the sawtooth grating groovesbeing unequally spaced. The concave diffraction gratingfor dispersing and focusing light is formed by preparing a planar diffraction grating with a sawtooth shape which is formed on a planar substrate by photo-lithography and etching or machining and which forms unequally spaced grating grooves, deforming and mounting the planar diffraction grating along a fixed convex substrate to obtain a mold of a concave diffraction grating, and transferring the mold of the concave diffraction grating to the surface of a metal or a resin.

Concave diffraction grating, method for producing the same, and optical device

A technique is provided which enables preparation of a curved grating having a desired curvature, by plastically deforming, along a curved substrate, a flat grating prepared by a semiconductor process on a silicon substrate, and which thus prepares a diffraction grating with high accuracy. A silicon flat grating prepared by a semiconductor process is transferred to an amorphous material, and the amorphous material substrate is curved and mounted on a curved fixed substrate, thus providing a curved grating having a crystalline material in which the generation of a dislocation line is restrained.

Curved grating, method for manufacturing the same, and optical device

A curved surface diffraction grating fabrication method for fabricating a curved surface diffraction grating having a desired curvature with high accuracy, includes: a step of forming a diffraction grating pattern on a flat-shaped silicon substrate; a step of curving the silicon substrate on which the diffraction grating pattern is formed, by pressing, in a heated state, a fixing substrate having a shape with a desired curved surface onto the silicon substrate and of fixing the silicon substrate on which the diffraction grating pattern is formed to the fixing substrate having the shape with the curved surface, to fabricate a curved surface diffraction grating cast; and a step of bringing a member having flexibility into contact with the curved surface diffraction grating cast, to transfer the diffraction grating pattern to the member.

Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same

A technique of forming an asymmetric pattern by using a phase shift mask, and further, techniques of manufacturing a diffraction grating and a semiconductor device, capable of improving accuracy of a product and capable of shortening manufacturing time. In a method of manufacturing a diffraction grating by using a phase shift mask (in which a light shield part and a light transmission part are periodically arranged), light emitted from an illumination light source is transmitted through the phase shift mask, and a photoresist on a surface of a Si wafer is exposed by providing interference between zero diffraction order light and positive first diffraction order light which are generated by the transmission through this phase shift mask onto the surface of the Si wafer, and a diffraction grating which has a blazed cross-sectional shape is formed on the Si wafer.

Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor device

In order to exposure interference fringes to photoresist and form a desired irregular pattern, it is necessary to know the cycle of the interference fringes in advance. In order to confirm the cycle of the interference fringes beforehand, conventional techniques include observing the formed irregular pattern with the use of a microscope or measuring a diffraction angle of incident light and repeating processes of exposure, development, and observation (measurement) while slightly changing incident angles of light fluxes for the formation of the interference fringes until a desired cycle is confirmed. These operations take considerable amount of time. The fact that it takes considerable amount of time to confirm the interference fringes has not been considered in the conventional techniques. Observation of a moire generated by a standard sample containing a fluorescent sample that can be repeatedly used and adjustment of the cycle of interference fringes reduce time for the adjustment.

Growing community of inventors

Tokyo, Japan

Yoshisada Ebata