Nissan Chemical Industries Limited

Nissan Chemical Corporation

The University of Toyama

Yoshiomi Hiroi

Takahiro Kishioka

Taito Nishino

Natsuki Abe

Rikimaru Sakamoto

Tomoyuki Ozawa

Yuki Usui

Ayako Otani

Tomohisa Ishida

Kohei Suzuki

Takafumi Endo

Shinichi Maeda

Tomoya Ohashi

Shigeo Kimura

Keisuke Nakayama

Hiroyuki Nakajima

Masaki Kitahara

Tomoyuki Enomoto

Hiroto Ogata

Naoki Nakaie

Tatsuro Kanaki

Makiko Umezaki

Ayako Aihara

Hiromi Kitano

Daisuke Sakuma

Tadashi Nakaji

Daisuke Maruyama

Junko Katayama

Makoto Gemmei

Minoru Hoshino

Yoshihito Tsukamoto

Miya Hiroi

Yuki Ueda

The invention provides a composition for forming a coating film containing a phosphoric acid group-containing polymer capable of forming a film on a substrate by a simple process and capable of maintaining film properties under a solvent environment containing water, and a coating film which is a cured product of the composition. In particular, the composition for forming a coating film contains (a) a polymer (P) containing a hydroxyl group, and the hydroxyl group is derived only from a phosphoric acid group, (b) a polycarbodiimide (C) containing a structure represented by the following formula (c-1):—N═C═N—  (c-1),and (c) a solvent.

Composition for forming coating film containing phosphoric acid group-containing polymer

The invention provides a method for producing a polymer used as a base film for cell culture which comprises (i) preparing a mixture containing (a) a monomer of formula (I): wherein Uand Ueach independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, Rrepresents a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and Rrepresents a linear or branched alkylene group having 1 to 5 carbon atoms, (b) a radical polymerization initiator, and (c) an organic solvent, and (ii) preparing a polymer by raising a temperature of the mixture under stirring to polymerize the monomer. The invention also provides methods of producing a base film for cell culture and a cell culture container.

Method for producing polymer used as base film for cell culture, and cell culture container

The invention relates to a cell culture container that inhibits adhesion of cells, a method for manufacturing the same and a method for producing cell aggregates using the same. The cell culture container has a coating film containing a copolymer having a recurring unit which contains a group represented by formula (a) and a recurring unit which contains a group represented by formula (b): wherein U, U, U, Uand Ueach independently represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and Anrepresents an anion selected from the group consisting of a halide ion, an inorganic acid ion, a hydroxide ion and an isothiocyanate ion, on at least a part of a surface of the container, and the volume of the container is 20 μL or less.

Cell culture container having minute volume

Methods for producing the amorphous metal oxide semiconductor layer where amorphous metal oxide semiconductor layer is formed by use of a precursor composition containing a metal salt, a primary amide, and a water-based solution. The methodology for producing the amorphous metal oxide semiconductor layer includes applying the precursor composition onto a substrate to form a precursor film, and firing the film at a temperature of 150° C. or higher and lower than 300° C.

Amorphous metal oxide semiconductor layer and semiconductor device

An object of the present invention is to provide a cryopreservation vessel which has a coating that is capable of inhibiting the adhesion of cells or proteins and is resistant not only to aqueous solvents but also to organic solvents (for example, cryoprotectants, in particular, dimethyl sulfoxide). The invention provides a cell or protein cryopreservation vessel including, on at least a portion of the surface thereof, a coating that includes a repeating unit containing a group represented by the following formula (a), and a repeating unit containing a group represented by the following formula (b) (wherein U, U, U, U, U, Uand Anare as defined in the description and the claims).

Cryopreservation vessel

This is to provide a coating film having a function of inhibiting adhesion of a biological substance, a method for manufacturing the coating film, a copolymer obtainable by polymerizing a specific monomer mixture, a composition for forming a coating film having a specific composition, a method for manufacturing a varnish containing a copolymer to be used as a raw material of the composition for forming a coating film which is used for forming said film, and a sol for forming the coating film. In particular, this is to provide a coating film obtained by the method comprising a process of applying a composition for forming a coating film which comprises a copolymer comprising a recurring unit containing an organic group of the formula (a) and a recurring unit containing an organic group of the formula (b) and a solvent onto a substrate; and a process of drying at a temperature of &#x2212;200&#xb0; C. to 200&#xb0; C. (wherein U, U, U, Uand U, and Anare as defined in the present specification and the claims). 

Ion complex material having function of inhibiting adhesion of biological substance and method for manufacturing the same

The invention provides a coating agent for a flow passage which comprises a copolymer containing a recurring unit which contains an organic group of the formula (a) wherein Uand Uare defined herein, and a recurring unit which contains an organic group of the formula (b) wherein U, U, U, and Anare defined herein. The invention also provides a flow passage device having the coating agent for a flow passage on at least part of an inner surface of a flow passage, a platelet-producing flow passage device and a method for manufacturing the same.

Coating agent for flow passage

The present invention is to provide a cell culture vessel comprising a copolymer which contains a recurring unit containing an organic group of the following formula (a) and a recurring unit containing an organic group of the following formula (b) being coated onto a surface thereof, a method for manufacturing the same and a method for manufacturing a cell aggregate using the same (wherein U, U, U, Uand U, and Anare as defined in the present specification and the claims). 

Cell culture vessel

The invention provides a precursor composition for forming an amorphous metal oxide semiconductor layer, containing a metal salt, a primary amide, and a water-based solution. An amorphous metal oxide semiconductor layer is formed by use of the composition.

Precursor composition for forming amorphous metal oxide semiconductor layer, amorphous metal oxide semiconductor layer, method for producing same, and semiconductor device

The present invention provides a copolymer obtainable by polymerizing a monomer mixture which contains at least compounds of the following formulae (A), (B) and (C), wherein T, T, T, U, U, U, Uand U, Q, Qand Q, R, Rand R, Anand m are as defined in Specification and Claims, and so on. The copolymer of the present invention can be utilized as an ion complex material excellent in a function of inhibiting adhesion of a biological substance. 

This is to provide a blood filter comprising a porous element; and a copolymer which exists in at least a part of a surface of the porous element, and which contains a recurring unit containing an organic group of the following formula (a) and a recurring unit containing an organic group of the following formula (b), 

Blood filter and method for manufacturing the same

There is provided a new material that can form a finer pattern and can be applied to adsorption/adhesion control of various cell species, proteins, viruses, and the like without the limitation of the light source. A light-degradable material comprising: a moiety that is capable of bonding to a surface of a substrate through a siloxane bond; and a structural unit of Formula (2-a) and/or Formula (2-b): (where Rto Rare saturated linear alkyl groups; X is a hydrogen atom or an alkyl group; Z is a carbanion or a sulfo anion; Q is an ester bond group, a phosphodiester bond group, an amido bond group, an alkylene group, or an phenylene group or a combination of these divalent groups; mis an integer of 1 to 200, and n is an integer of 1 to 10).

Light-degradable material, substrate, and method for patterning the substrate

A resist underlayer film-forming composition containing a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2), a cross-linkable compound, a cross-linking catalyst, and a solvent. wherein A is a divalent organic group containing a triazine ring, Xis an &#x2014;S&#x2014; group or an &#x2014;O&#x2014; group, Q is a linear, branched, or cyclic hydrocarbon group having a carbon atom number of 1 to 15, the hydrocarbon group may have at least one sulfur atom or oxygen atom in a main chain and at least one hydroxy group as a substituent, n is 0 or 1, Rand Rare each independently a Calkylene group or a single bond, Z is a divalent group having at least one sulfur atom or oxygen atom, and when Xis an &#x2014;O&#x2014; group, Z is a divalent group having at least one sulfur atom.

Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain

This charge-transporting varnish, which contains a solvent, an electron-accepting dopant substance, and an aryldiamine compound represented by formula (1), imparts a charge-transporting thin film that has high transparency and can evince favorable element characteristics when applied to an organic EL element. (In the formula: R-Reach independently represent a hydrogen atom, a halogen atom, a nitro group, a cyano group, a hydroxyl group, a thiol group, a phosphate group, a sulfone group, a carboxyl group, an alkoxy group having 1-20 carbon atoms, or the like; R-Reach independently represent a hydrogen atom, a phenyl group, a naphthyl group, a pyridyl group, a pyrimidinyl group, a pyridazinyl group, a pyrazinyl group, a furanyl group, a pyrrolyl group, a pyrazolyl group, an imidazolyl group, a thienyl group, or the like; and n represents an integer from 2 to 5.)

Growing community of inventors

Toyama, Japan

Yoshiomi Hiroi