Canon Kabushiki Kaisha

Yoshio Suzaki

Kazuhiko Mishima

Noburu Takakura

Tomomi Funayoshi

Toshihiko Nishida

Satoru Jimbo

Isamu Seto

Masamichi Kuwabara

The present invention provides a processing apparatus comprising: a generator configured to generate, based on image data of a measurement target, position information of the measurement target in a first direction; and a determinator configured to determine, based on a feature quantity of the image data related to a second direction different from the first direction, confidence of the position information of the measurement target generated by the generator.

Processing apparatus, measurement apparatus, lithography apparatus, method of manufacturing article, model, processing method, measurement method, generation method, and generation apparatus

A template for imprint comprises a main body having a bottom surface, a middle surface on a portion protruding relative to the bottom surface, and a pattern surface on a portion protruding relative to the middle surface, the pattern surface having an uneven pattern, wherein an outer edge of the pattern surface has a jigsaw shape, wherein a light-shielding member having a light transmittance lower than a light transmittance of the main body is disposed on the middle surface to surround the outer edge of the pattern surface in a plan view as viewed from the pattern surface, and wherein an outer edge of light-shielding member defines four sides having a shape in which a center of each side bulges outward with respect to a rectangle surrounding the outer edge of the pattern surface in the plan view, and wherein the shape of each side bulges outwardly in a stepwise manner from the ends of each side to the center of each side.

Template for imprint and imprint method using template

A charged particle beam writing apparatus includes an aperture array configured to be capable of forming a plurality of charged particle beams using a plurality of openings, an element array including a plurality of main elements and a plurality of auxiliary elements different from the main elements, and a control unit configured to acquire information associated with a defect of the plurality of main elements and control the element array in accordance with the information, wherein the control unit controls the element array such that only the main elements are used when there is no defect, while when there is a main element having a defect, an auxiliary element is used without using the main element having the defect.

Charged particle beam writing apparatus and device production method

Growing community of inventors

Tochigi, Japan

Yoshio Suzaki