Japan Synthetic Rubber Co., Ltd.

Desoto, Inc.

Other

Hodogaya Chemical Co., Ltd.

Yoshio Matsumura

Ikuo Nozue

Takashi Ukachi

Osahiko Tomomitsu

Robert E Ansel

Yoshiji Yumoto

Teizo Kotani

Clive J Coady

Katsutoshi Igarashi

Taro Suminoe

Kazuaki Okabe

Donald W Fieder

Keiichi Bessho

Naoshi Yasuta

Atsushi Kumano

A radiation-curable coating composition adapted for the coating of optical glass fiber, comprising an ethylenically unsaturated polyurethane which is the reaction product of:

Composition for optical fiber coating comprising a polyether diol, a

There is disclosed acrylate-terminated oligomers which are radiation-curable and which can be pigmented with magnetizable power to cure on electron beam exposure to provide superior magnetic recording structures. These oligomers include sulfonic acid groups which improve pigment wetting and which can be included in amide-containing compounds.

Radiation curable composition

A novel raddery organopolysilsesquioxane having lower alkyl groups and alkenyl groups as the side chains and, if necessary, having aryl groups and/or hydrogen atoms bonded as the side chains can be produced by adding water to a solution of a lower-alkyltrihalogenosilane, an alkenyltrihalogenosilane, and, if necessary, an aryltrihalogenosilane and/or a trihalogenosilane in an organic solvent, and heating the resulting mixture. The aforesaid organopolysilsesquioxane can be used for forming a patterned surface-protecting layer or insulating layer for a semiconductor device, in the form of a mixture with a compound which generates crosslinking-reaction-active species upon irradiation with light or an ionizing radiation.

Solvent-soluble organopolysilsesquioxane, process for producing the

A laddery lower alkylpolysilsesquioxane represented by the formula: ##STR1## wherein R and R' represent same or different lower alkyl groups, and n represents an average degree of polymerization, said laddery lower alkylpolysilsesquioxane having a heat-resistant thin film-formability, characterized in that 15 to 30% by weight of the lower alkylpolysilsesquioxane is occupied by the portion having a standard polystyrene-reduced molecular weight of 20,000 or less as measured by gel permeation chromatography. Said silicone resin in which R and R' are methyl is prepared by dissolving CH.sub.3 SiCl.sub.3 in a ketone or an ether, adding water to this solution with stirring to hydrolyze CH.sub.3 SiCl.sub.3, condensing the hydrolyzate and, if necessary, subjecting the resulting condensate to a treatment for adjusting the proportion of the low molecular weight portion in the product.

Laddery lower alkylpolysilsesquioxane having heat-resistant thin

A process for treating an acetylene polymer or a doped acetylene polymer, which comprises plasma-polymerizing a gasifiable organic compound under plasma-excitation under reduced pressure, thereby forming a polymer film on the solid surface of an acetylene polymer or a doped acetylene polymer placed in said polymerization reaction system. This process can prevent the acetylene polymer or doped acetylene polymer from being deteriorated owing to oxidation.

Process for treating acetylene polymer or doped acetylene polymer

Doped acetylene polymers are produced by immersing an acetylene polymer under an inert gas atmosphere in an organic solvent solution of a dopant selected from the group consisting of a platinum group metal complex, a carbonium salt, an oxonium salt and a parabenzoquinone derivative. According to this process, a doped acetylene polymer having any desired electrical conductivity can be produced and the doped acetylene polymer thus obtained has excellent properties as an organic semiconductor material for solar batteries, various sensors, etc.

Doped acetylene polymer and process for production thereof

Growing community of inventors

Yamato, Japan

Yoshio Matsumura