Screen Holdings Co., Ltd.

Yoshio Furuya

Masahiko Kokubo

Kazutaka Taniguchi

Ryo Yamada

Yoshiyuki Nakazawa

Kenji Nakanishi

Fujikazu Kitamura

Ryosuke Ito

Masaki Sasada

A light irradiation apparatus () includes a light source unit () and an irradiation optical system (). In the light source unit, light source parts () arrayed in a plane emit laser light toward the irradiation optical system from different directions along the plane, and by the irradiation optical system, the laser light is guided along an optical axis (J) to an irradiation plane (). The irradiation optical system includes a division lens part (), an optical path length difference generation part (), and a condensing lens part (). The division lens part includes element lenses () that divide light incident from the light source parts. The optical path length difference generation part includes transparent parts () having different optical path lengths from each other, and light that has passed through the element lenses respectively enters the transparent parts. The condensing lens part superimposes irradiation regions () of the light from the transparent parts on each other on the irradiation plane. Accordingly, the irradiation plane can be irradiated with high-intensity light having a uniform intensity distribution.

Light irradiation apparatus and drawing apparatus

Laser light from a light source part is guided to an irradiation plane by an irradiation optical system including element lenses and transparent parts. Light fluxes having passed through the element lenses respectively enter the transparent parts. A light condensing part superimposes irradiation regions of the light fluxes on the irradiation plane. When viewed in the arrangement direction of the element lenses, the light fluxes regarded as parallel light enter the light condensing part which includes a diverging lens for causing the parallel light to diverge in a Y direction perpendicular to the arrangement direction, and a converging lens for causing the light from the diverging lens to converge on the irradiation plane. This configuration readily achieves a design where the focal length of the light condensing part regarding the Y direction is reduced, and suppresses shifts in light condensing positions of the light fluxes on the irradiation plane.

A drawing device draws a pattern on a substrate by radiating light from an optical head part on a target object (for example, substrate) which relatively moves with respect to the optical head part. Here, the optical head part has a spatial modulating unit which spatially modulates light from a light source, based on pattern data, and an optical path corrector which shifts the route of light spatially modulated in the spatial modulating unit at precision subdivided more than units of spatial modulation in the spatial modulating unit (more specifically, for example, units of pixels of spatial light modulator).

Drawing device and drawing method

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Kyoto, Japan

Yoshio Furuya