Tokyo Electron Limited

Tokai National Higher Education and Research System

Yoshinori Morisada

Tsuyoshi Moriya

Tatsuya Yamaguchi

Satoshi Tanaka

Masaru Hori

Makoto Sekine

Kippei Sugita

Makoto Fujikawa

Tadahiro Ishizaka

Hirotsugu Sugiura

In a hard mask formed on a target film formed on a substrate, a first film having a stress in a first direction and a second film having a stress in a second direction opposite to the first direction are alternately stacked one or more times.

Hard mask, substrate processing method, and substrate processing apparatus

According to one embodiment, there is provided a carbon hard mask laminated on an etching target film, in which the concentration ratio of a methylene group CHand a methyl group CHcontained in the carbon hard mask satisfies the expression CH/(CH+CH)≥0.5.

Carbon hard mask, film forming apparatus, and film forming method

A method for improving a chemical resistance of a polymerized film, which is formed on a surface of a target object and to be processed by a chemical, includes: consecutively performing a treatment for improving the chemical resistance of the polymerized film subsequent to formation of the polymerized film within a processing chamber of a film forming apparatus where the polymerized film is formed, without unloading the target object from the processing chamber.

Method for improving chemical resistance of polymerized film, polymerized film forming method, film forming apparatus, and electronic product manufacturing method

A polymerized film forming method for forming a polymerized film on a target surface of a workpiece using a first raw material gas which contains a first monomer and a second raw material gas which contains a second monomer differing from the first monomer includes: supplying the first raw material gas wherein difunctional non-aromatic amine having a hydrolyzable group is used for the first monomer; and supplying the second raw material gas wherein difunctional acid anhydride is used for the second monomer.

Polymerized film forming method

Growing community of inventors

Nirasaki, Japan

Yoshinori Morisada