Mitsubishi Denki Kabushiki Kaisha

Yoshinobu Hirokado

Naoki Yasuda

Yosuke Suzuki

Kunihiko Nishimura

Yuichiro Murata

Shinichiro Nagano

Hiroshi Miwa

Satoru Kawamoto

Yuji Ohmura

The step of forming an opening in an insulating layer to expose a carbon nanotube layer is performed using two types of dry etching different from each other in conditions. In the first-stage dry etching step, a hole is formed in the insulating layer to such a depth as not exposing the carbon nanotube layer. Thereafter, in the second-stage dry etching step, a bottom surface portion of the hole is removed, thus exposing an upper surface of the carbon nanotube layer. A method of manufacturing an electron emission source capable of improving performance of an electron emission portion is thus obtained.

Method of manufacturing electron emission source

A cold cathode light emitting device includes a plurality of first electrodes, a plurality of insulating layers, a plurality of second electrodes and a third electrode. The insulating layers are laminated on the first electrodes. The second electrodes are provided on the insulating layers to intersect the first electrodes. The third electrode emits light upon receipt of electrons. At least one hole is provided at intersections of the first electrodes and second electrodes. The hole has a first diameter d1 at a position where the insulating layers are in contact with the first electrodes and a second diameter d2 at a position where the insulating layers are in contact with the second electrodes, where d1 is smaller than d2. A nanofiber-structure layer is formed on the first electrodes in an opening portion having the first diameter d1, provided in the at least one hole on the side of the first electrodes.

Cold cathode light emitting device with nano-fiber structure layer, manufacturing method thereof and image display

An AC plane discharge type plasma display panel comprises the first substrate section comprising a glass substrate containing sodium oxide, an insulating film being a SiO film having about 100 nm in thickness and formed by dry film formation method on the surface of the glass substrate, plural pairs of discharge sustain electrodes each comprising a transparent electrode and a bus electrode and formed on the insulating film, a dielectric layer formed on the insulating film in such a manner as to cover the plural pairs of discharge electrodes, and a cathode film formed on the dielectric layer.

AC plane discharge type plasma display panel

A composite magnetic head having a head chip including an erasing core, a recording/reproducing core and a center core disposed between the erasing core and the recording/reproducing core. The erasing core is joined to the center core via a first nonmagnetic material which forms an erasing gap, and the recording/reproducing core is joined to the center core via a second nonmagnetic material which forms a recording/reproducing gap. The composite magnetic head has an erasing coil, a recording/reproducing coil, a first back bar for magnetically coupling the erasing core with the center core, and a second back bar for magnetically coupling the recording/reproducing core with the center core. The composite magnetic head satisfies both of following conditional expressions:

Growing community of inventors

Tokyo, Japan

Yoshinobu Hirokado