Other

University of Hyogo

Daiken Chemical Co., Ltd.

Nihon Spindle Manufacturing Co., Ltd.

Kabushiki Kaisha Dainichi Seisakusho

Yoshimi Nishimura

Akio Harada

Keiichi Asami

Hirofumi Takikawa

Yoshihiro Oka

Tomohiro Hashimoto

Katsuhiko Yonezawa

In order to provide a dispersion method and a dispersion apparatus capable of mixing a material to be processed and a dispersion medium having no affinity with each other using a single apparatus without using a dispersant, there are provided a quantitative supply mechanism quantitatively supplying a material to be processed, a suction stirring mechanism primarily including a suction stirring pump in which the material to be processed and a dispersion medium are subjected to negative pressure suction by a negative pressure suction force generated by rotation of a rotating blade and the suctioned material to be processed and the dispersion medium are stirred and mixed by the rotating blade and are allowed to pass through a throttle passage to cause cavitation, and a plasma generating mechanism generating a plasma in bubbles formed due to cavitation in a mixed liquid of the material to be processed and the dispersion medium.

Dispersion method and dispersion apparatus for material to be processed and method for producing mixed liquid of material to be processed and dispersion medium produced thereby

A power supply circuit for plasma generation by which a large quantity of generated plasma can be smoothly obtained without increasing the sizes of an apparatus. An electric discharge generating electrode is composed of two or more first electrodes and one or more second electrodes. An LC series circuit is provided by connecting a capacitor C and a coil L in series between one of outputs of an alternating high voltage generating circuit which generates an alternating high voltage to be applied between the electrodes of electric discharge generating electrode, and the first electrode. When electricity is discharged in one of the electrode pair, voltage drop is suppressed by the coil, and since electric discharge from the other electrode pair is induced without being disturbed, a large quantity of plasma can be smoothly generated by common use of the alternating high voltage generating circuit.

Power supply circuit for plasma generation, plasma generating apparatus, plasma processing apparatus and plasma processed object

Growing community of inventors

Kyoto, Japan

Yoshimi Nishimura