Sony Corporation

Yoshimi Hirata

Takaaki Yamada

Shuichi Sato

Hiroyuki Matsumoto

Shigeo Kubota

Hiroyuki Wada

Makoto Takatoku

Hisayoshi Yamoto

Nobuhiko Umezu

Koichi Tatsuki

Ayumu Taguchi

Yukiyasu Sugano

Teruaki Aoki

Tadashi Hattori

Tetsuo Abe

Akifumi Ooshima

Masanori Okayama

Makoto Hirabayashi

The state of a polysilicon film formed by excimer laser annealing an amorphous silicon film is to be evaluated. When the amorphous silicon film is annealed to form a polysilicon film, linearity or periodicity presents itself in the spatial structure of the film surface of the polysilicon film formed depending on the energy applied to the amorphous silicon during annealing. This linearity or periodicity is processed as an image and represented numerically from the image by exploiting the linearity or periodicity. The state of the polysilicon film is checked based on the numerical results.

Polysilicon evaluating method, polysilicon inspection apparatus and method for preparation of thin film transistor

A solid state image sensor is disclosed which includes a photosensitive region consisting of a group of first vertical shift registers formed of a plurality of charge transfer devices, light receiving areas, which are located between adjacent ones of the group of first vertical shift registers, electrically separated from one other by a channel stop region and capable of accumulating a charge, and read-out gate sections transferring signal charges of the light receiving areas to corresponding one of the first vertical shift registers, a storage section consisting of a group of second vertical shift registers electrically connected to one end of the vertical shift registers, a charge transfer horizontal shift register electrically connected to one end of the second vertical shift registers, and a section for field-reading out the signal charges in the photosensitive areas, the potentials of the read-out gate sections during the light receiving and accumulating period are selected to be different between the periods before and after the vertical blanking period during which a signal of an opposite field is read out whereby a processing charge proportional to the amount of light impinging on receiving areas during the preceding period is made smaller than that during the succeeding period.

Solid state image sensor applied with differing read-out gate voltages

A control circuit for signal transmission which comprises a plurality of field effect transistors (which will be hereinafter referred to as simply FETs) with gates of high resistance is disclosed. In this case, the sources and drains of the FETs are connected commonly and connected in parallel to a signal transmission path, their gates are supplied with different voltages, and the mutual conductances among the FETs are selected to be reduced gradually.

Control circuit for signal transmission

A thin film resistor is formed of polycrystalline silicon which contains 2 to 45 atomic percent of oxygen and wherein the resistivity of the polycrystalline silicon film varies as a function of the amount of oxygen contained in the film and wherein the resistivity is substantially higher than polycrystalline silicon not containing oxygen.

Thin film resistor

Growing community of inventors

Atsugi, Japan

Yoshimi Hirata