Fuji Photo Film Company, Limited

Yoshimasa Aotani

Akira Umehara

Tsuguo Yamaoka

Kouichi Kawamura

Hiroshi Misu

Hiroshi Takahashi

Toshiaki Aoai

Masayuki Iwasaki

Syunichi Kondo

Shunichi Kondo

Akira Nishioka

Koichiro Aono

Yoshiharu Yabuki

Fumiaki Shinozaki

Keisuke Shiba

Nobuo Furutachi

Tomoaki Ikeda

Seiji Horie

Tadahiro Sorori

Takao Masuda

Isamu Itoh

Shiro Tan

Tadayoshi Kokubo

Nobuo Sakai

Kazuo Maemoto

Toshifumi Inno

Sadao Ishige

Takekatsu Sugiyama

Itsuo Fujiwara

Koji Tamoto

Hirokazu Kondo

Tatsuji Higashi

Minoru Maeda

Akira Nagashima

Fumiyuki Nishiyama

Teruo Nagano

Mitsumasa Tsuchiya

Yukio Abe

Fumihiro Tokunaga

Yasuhisa Narutomi

Eiji Nakakita

Nobuaki Matsuda

Yasunori Takata

Kotaro Yamasue

Teruo Kojima

Kouichi Kawamma

A positive-working light-sensitive composition comprising (a) a compound having at least two enol ether groups, represented by the following general formula (I); (b) a linear polymer having acidic groups; and (c) a compound capable of generating an acid through irradiation with actinic light rays or radiant rays, the component (a) and the component (b) being thermally crosslinked:

Positive-working light-sensitive composition

A photopolymerizable composition is described, comprising components (i) a compound having at least one addition-polymerizable ethylenically unsaturated bond, (ii) a compound represented by the following formula (I): ##STR1## and (iii) an activating agent which generates an active radical upon light irradiation in the co-presence of component (ii). The substituents in formula (I) are defined in the specification.

Photopolymerizable composition including a photopolymerization

A positive-working light-sensitive composition comprises a diazonium salt represented by the following general formula (I) and an alkali-soluble polymer: ##STR1## wherein R.sup.1 represents a substituted or unsubstituted alkyl group having 3 to 18 carbon atoms; R.sup.2 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted phenoxy group or a halogen atom; A represents an organic group; X.sup.-- represents a counterion or an anion; n is an integer ranging from 1 to 4 and m is an integer ranging from 1 to 3, provided that the sum of n and m is equal to 4. The positive-working light-sensitive composition has high sensitivity and can ensure the formation of clear images.

Positive-working light-sensitive composition containing diazonium salt

A positive-working light-sensitive composition whose solubility in a developer is increased by irradiation of light, which comprises:

Light-sensitive composition

The photosensitive resin composition of the present invention comprises an admixture of 5 to 100 weight parts of a photosensitive material having the following general formula (A) and 100 weight parts of an alkali-soluble resin: General formula (A) ##STR1## where R.sub.1 to R.sub.8 each independently represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxyl group, an aralkyl group, an aryl group, an amino group, a monoalkylamino group, a dialkylamino group, an acylamino group, an alkylcarbamoyl group, an arylcarbamoyl group, an alkylsulfamoyl group, an arylsulfamoyl group, a carboxyl group, a cyano group, a nitro group, an acyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, or --OD, --N(R)--D (where R represents a hydrogen atom or an alkyl group, and D represents a 1,2-napthoquinoediazide-5-sulfonyl group or a 1,2-napthoquinoediazide-4-sulfonyl group), and at least one of R.sub.1 to R.sub.8 represents --OD or --N(R)--D; R.sub.9 to R.sub.12 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.9 and R.sub.10 and/or R.sub.11 and R.sub.12 may form a ring; R.sub.13 to R.sub.14 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.13 or R.sub.14 and any of R.sub.15 or R.sub.16 may form a ring, whereas at least one of R.sub.13 to R.sub.16 is a substitution group other than hydrogen; and Z represents an oxygen atom or a single bond.

Photosensitive resin composition utilizing 1,2-naphthoquinone diazide

A photopolymerizable composition comprises a photopolymerizable ethylenically unsaturated compound having at least two terminal ethylene groups, a photopolymerization initiator and an organic polymer binder, wherein the photopolymerization initiator is an aromatic sulfonic acid salt of an onium compound. The composition has high sensitivity to actinic rays over a wide range of wavelength extending from ultraviolet to visible region and thus can be used for preparing a lithographic printing plate, a resin-letterpress plate, a resist or photomask for making a printed board, a monochromatic and colored sheet for transfer or color-development and a color-developing sheet.

Photopolymerizable composition

A positive working photosensitive composition comprising a polymeric compound insoluble in water but soluble in an aqueous alkaline solution and an aromatic sulfonic acid salt of an onium compound. The positive working photosensitive composition having high sensitivity and being capable of forming high-contrast images.

Positive working photosensitive composition

Microcapsules are disclosed containing (a) a vinyl compound which has at least two polymerizable, ethylenically unsaturated groups linked to each other through a linking group comprising a chemical bond capable of being split by the action of an acid, (b) a thermal polymerization initiator, and (c) one or more compounds capable of producing acid when irradiated with actinic radiation. A light-sensitive recording material is also disclosed, which has on its support the above-described microcapsules or a thermally cured product thereof.

Microcapsules and light-sensitive recording material using the same

Light-sensitive compositions comprise a light-sensitive diazo resin, a binder and a compound having a pivaloyl group. Lithographic printing plates prepared by using the light-sensitive compositions of the invention are excellent in ink receptivity.

Light-sensitive composition and presensitized plate with light-sensitive

A photopolymerizable composition is described, comprising an addition polymerizable unsaturated compound having at least two ethylenically unsaturated double bonds per molecule, a photopolymerization initiator, and a binder, wherein said binder is a copolymer represented by formula (I) ##STR1## wherein Ar.sup.1 and Ar.sup.2 each represent a substituted or unsubstituted phenyl group; and n.sub.1, n.sub.2, n.sub.3, and n.sub.4 each represents mol % of the respective repeating unit, wherein n.sub.1 is from 0 to about 70; n.sub.2 is from 0 to about 70; n.sub.3 is from about 5 to 50; and n.sub.4 is from about 5 to 50; provided that n.sub.1 and n.sub.2 are not 0 at the same time, the sum of n.sub.3 and n.sub.4 is from about 30 to 80. The composition is useful as an alkali-developable light-sensitive layer which provides a photosensitive dry film resist having excellent performance characteristics.

Photopolymerizable composition on polyethylene terephthalate film support

A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.

Positively working resist material

A light-sensitive composition is herein disclosed, which comprises at least one light-sensitive s-triazine compound represented by the following general formula (I) and at least one compound having at least one ethylenically unsaturated double bond and capable of causing addition polymerization: ##STR1## wherein R.sub.1 and R.sub.2 independently represent hdyrogen atom, a substituted or unsubstituted alkyl or aryl group, or a group represented by the general formula: R.sub.5 --CO-- or N(R.sub.6) (R.sub.7)--CO-- (wherein R.sub.5 stands for a substituted or unsubstituted alkyl or aryl group; and R.sub.6 and R.sub.7 independently represent hydrogen atom or a substituted or unsubstituted alkyl or aryl group), provided that R.sub.1 and R.sub.2 may form a heterocyclic ring consisting of non-metallic atoms together with the nitrogen atom to which they are bonded; R.sub.3 and R.sub.4 represent hydrogen, a halogen, an alkyl or an alkoxyl; X and Y independently represent chlorine or bromine; and m and n are 0, 1 or 2. The light-sensitive composition has high sensitivity even after storing at a high temperature and effectively used for producing light-sensitive plates for making lithographic printing plates; proof plates for printing; films for overhead projector, intermediate print and photomasks; and photoresists.

A light-sensitive composition containing a novel light-sensitive s-triazine compound represented by the formula (I) as a free radical-generating agent is disclosed. The s-triazine compound responds radiation in the range of the near ultraviolet to visible light, shows high sensitivity for photolysis and, therefore, the compositon has high light-sensitivity. ##STR1##

Light sensitive composition containing a light sensitive s-triazine

A negative working light-sensitive lithographic plate requiring no dampening solution and a plate making process are described, the negative working light-sensitive lithographic plate comprising a support having, in sequence, on said support, (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction under a basic environment, and (B) a silicone rubber layer, and the plate making process comprising imagewise exposing the negative working light-sensitive lithographic plate and developing said exposed plate to obtain a lithographic plate requiring no dampening solution, wherein a step of processing with base is carried out after imagewise exposure.

Plate making processing for using negative working light-sensitive

A photopolymerizable composition containing an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator is disclosed, wherein the photopolymerizable composition contains at least one compound represented by following general formula (I) or (II) as the photopolymerization initiator: ##STR1## wherein, R.sub.1, R.sub.2, R.sub.3, R.sub.4, and R.sub.5 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an allyl group or a substituted allyl group, said R.sub.1 and R.sub.2 may combine with each other to form a ring together with the carbon atoms to which they are bonded; Y represents --O--, --S--, --Se--, --C(CH.sub.3).sub.2 -- or --CH.dbd.CH--; X.sub.1 represents an oxygen atom or a sulfur atom; R.sub.11, R.sub.12, R.sub.17, and R.sub.18 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an allyl group, or a substituted allyl group; R.sub.13, R.sub.14, R.sub.15, and R.sub.16 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, a halogen atom, a carboalkoxy group, or an alkoxy group; said R.sub.11 and R.sub.15, said R.sub.12 and R.sub.13, said R.sub.15 and R.sub.16, and said R.sub.13 and R.sub.14 each may combine with each other to form a ring together with the carbon atoms to which they are bonded; and X.sub.2 represents an oxygen atom or a sulfur atom.

Photopolymerizable compositions

Growing community of inventors

Shizuoka, Japan

Yoshimasa Aotani