Tokuyama Corporation

Screen Holdings Co., Ltd.

Yoshiki Seike

Seiji Tono

Kenji Kobayashi

Sei Negoro

Hiromasa Yamamoto

Fumiaki Iwasaki

Kenji Tanaka

Manami Oshio

Masahiko Seki

A silicon etching liquid which is characterized by containing a quaternary ammonium hydroxide represented by formula (1), a quaternary ammonium salt represented by formula (2) and water, and which is also characterized in that the concentration of the quaternary ammonium salt represented by formula (2) is more than 1% by mass but not more than 50% by mass. (1): RRRRN·OH(In formula (1), R, R, Rand Rmay be the same groups or different groups, and each represents an optionally substituted alkyl group, aryl group or a benzyl group.) (2): RRRRN·X(In formula (2), R, R, Rand Rmay be the same groups or different groups, and each represents an optionally substituted alkyl group having from 1 to 16 carbon atoms; and X represents BF, a fluorine atom, a chlorine atom or a bromine atom.)

Silicon etching liquid, and method for producing silicon device and method for processing silicon substrate, each using said etching liquid

A silicon etching solution includes a mixed solution comprising a quaternary alkylammonium hydroxide and water and further comprises a compound represented by the following formula (1):RO—(CHO)—R  (1)wherein Ris a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, Ris a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, m is an integer of 2 to 6, and n is 1 or 2.

Silicon etching solution and method for producing silicon device using the etching solution

A silicon etching solution includes a mixed solution comprising a quaternary alkylammonium hydroxide and water and further comprises a compound represented by the following formula (1):RO&#x2014;(CHO)&#x2014;R&#x2003;&#x2003;(1)wherein Ris a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, Ris a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, m is an integer of 2 to 6, and n is 1 or 2.

In the method, a trione compound represented by the following formula (1) is (i) reduced by NaAlH(OCHCHOCH)and subsequently further reduced by a metal borohydride salt, or (ii) reduced by calcium borohydride, thereby producing an amide alcohol compound represented by the following formula (3) (wherein, Rand Rmay be the same or different and each represents a hydrogen atom or a protecting group of an ureylene group; Rrepresents an alkyl group, an aralkyl group, or an aryl group; and each of R, R, and Rrepresents a hydrogen atom, an alkyl group, an alkoxy group, or a halogen atom). 

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Yamaguchi, Japan

Yoshiki Seike