Adeka Corporation

Yoshiki Ooe

Atsushi Yamashita

Tomoharu Yoshino

Akihiro Nishida

Nana Okada

Keisuke Takeda

Ryota Fukushima

Chiaki Mitsui

Provided is a tin compound, which is represented by the following general formula (1):

Tin compound, thin-film forming raw material, thin-film, method for producing thin-film, and halogen compound

The present invention provides a tin compound represented by the following general formula (1) (in the formula (1), Rto Reach independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and Rrepresents an alkanediyl group having 1 to 15 carbon atoms), a thin-film forming raw material including the compound, a thin-film formed by using the thin-film forming raw material, a method of using the compound as a precursor for producing the thin-film, and a method of producing a thin-film including: introducing a raw material gas obtained by vaporizing the thin-film forming raw material into a treatment atmosphere having a substrate set therein; and subjecting the tin compound in the raw material gas to decomposition and/or a chemical reaction in the treatment atmosphere, to thereby produce a thin-film containing a tin atom on a surface of the substrate.

Tin compound, thin-film forming raw material containing said compound, thin film formed from said thin-film forming raw material, method of producing said thin film using said compound as precursor, and method of producing said thin film

The present invention provides an amidinate compound represented by the following general formula (1) or a dimer compound thereof, and a method of producing a thin-film including using the compound as a raw material: where Rand Reach independently represent an alkyl group having 1 to 5 carbon atoms, Rrepresents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M represents a metal atom or a silicon atom, and 'n' represents the valence of the atom represented by M, provided that at least one hydrogen atom of Rto Ris substituted with a fluorine atom.

Amidinate compound, dimer compound thereof, thin-film forming raw material, and method of producing thin film

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Tokyo, Japan

Yoshiki Ooe