Hitachi-high-technologies Corporation

Yoshikazu Inada

Eiichi Hazaki

Osamu Yamada

Yasuhiro Mitsui

Takashi Furukawa

Susumu Kato

Hiroshi Yanagita

Osamu Satou

Mari Nozoe

Yasuhiko Nara

Yasuhiro Gunji

Taku Ninomiya

Ryuichi Funatsu

Tsutomu Saito

Hirofumi Sato

Yoshinori Numata

Kenjirou Yamamoto

For adjusting a positional relationship between a specimen and a probe to measure an electric characteristic of the specimen through a contact therebetween, a base table holding a specimen table holding the specimen and a probe holder holding the probe is positioned at a first position to measure the positional relationship between the probe and the specimen at the first position, and subsequently positioned at a second position to measure the positional relationship therebetween at the second position so that the probe and the specimen are contact each other at the second position, the specimen table and the probe holder are movable with respect to each other on the base table at each of the first and second positions to adjust the positional relationship between the probe and the specimen, and a measuring accuracy at the second position is superior to a measuring accuracy at the first position.

Defective product inspection apparatus, probe positioning method and probe moving method

An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the defect and its vicinity with an electron beam a plurality of times at predetermined intervals; detecting an electron signal secondarily generated from the sample surface by the electron beam; imaging an electron signal detected by the previously specified n-th or later electron beam irradiation; and measuring the resistance or a leakage amount of the defective portion of the sample surface in accordance with the degree of charge relaxation by monitoring the charge relaxation state of the sample surface based on the electron beam image information.

Inspection method and inspection apparatus using electron beam

A defect inspecting apparatus in which a plurality of probes to measure electric characteristics of a sample including a fine wiring pattern are combined with a charged-particle beam unit includes graphic user interfaces (GUI) to simply control the plural probes. The apparatus includes a probe image processing unit to display the plural probes on a display; a selecting unit to select, from the probes displayed on the display, a probe to be operated; and a display unit to simultaneously display the probe selecting unit and information indicating that the selected probe is an operable probe, or the probe is in a non-selected state.

Defect inspecting apparatus

Growing community of inventors

Hitachinaka, Japan

Yoshikazu Inada