Tanabe Seiyaku Company, Limited

Dainippon Screen Mfg. Co., Ltd.

Yoshihisa Yamada

Toyonari Oine

Totaro Yamaguchi

Satoshi Ohshima

Hiroshi Sugano

Yuzo Matsuoka

Ryuichi Ishida

Takashi Taguchi

Mitsuyoshi Wagatsuma

Masafumi Maeda

Ichizo Inoue

Takashi Ochiai

Masakazu Sanada

Tsuyoshi Mitsuhashi

Yukihiko Inagaki

Kenji Sugimoto

Minobu Matsunaga

Kazuhito Shigemori

Mamoru Matsumoto

Katsushi Yoshioka

Satoshi Yamamoto

Kaoru Aoki

Mitsumasa Kodama

Moritaka Yano

Takashi Nagao

Junichi Tani

Masanori Yoshioka

Akiyoshi Yoda

Gunji Yoshimura

A forward direction-only path (first substrate transport path) is formed for transporting substrates in a forward direction to pass the substrates on to an exposing apparatus. A separate, substrate transport path (second substrate transport path) is formed exclusively for post-exposure bake (PEB). Substrate transport along each path is carried out independently of substrate transport along the other. A fourth main transport mechanism is interposed as a predetermined substrate transport mechanism between transfer points consisting of a buffer acting as a temporary storage module for temporarily storing the substrates and a post-exposure bake (PEB) unit corresponding to a predetermined treating unit. This arrangement forms the path for transporting the substrates between the buffer and the PEB unit, to allow PEB treatment of the substrates to be performed smoothly. Similarly, the substrates are transported smoothly to the buffer.

Substrate treating apparatus

A substrate processing apparatus includes a coating section, a developing section, a heat-treating section and a transport mechanism. The coating section has first processing units each for performing a coverage process to supply a photoresist solution to a substrate and cover a surface of the substrate with the photoresist solution, a second processing unit for spinning the substrate, after the coverage process, at high speed to make the photoresist solution into a film, dry the photoresist film, and clean the substrate. All substrates are processed with the same coating conditions to suppress differences in quality among the substrates. The first and second processing units perform the respective processes concurrently to improve the throughput of substrate processing.

Substrate processing apparatus

A process for preparing hydrochloride of 3-acetoxy-2,3-dihydro-5-[2-(dimethylamino)ethyl]-2-(p-methoxyphenyl)-1,5-b enzothiazepin-4(5H)-one which comprises reacting 3-hydroxy-2,3-dihydro-5-[2-(dimethylamino)ethyl]-2-(p-methoxyphenyl)-1,5-b enzothiazepin-4(5H)-one which acetyl chloride in acetic acid or a mixed solvent of acetic acid and acetic anhydride. According to the process, hydrochloride of 3-acetoxy-2,3-dihydro-5-[2-(dimethylamino)ethyl]-2-(p-methoxyphenyl)-1,5-b enzothiazepin-4(5H)-one is readily obtained in one step.

Process for preparing 1,5-benzothiazepine derivative

A quinazolinone derivative of the formula: ##STR1## wherein R.sup.1 is hydrogen atom or a halogen atom, or a salt thereof and processes for preparing the same are disclosed. The quinazolinone derivative (I) is useful for treatment of diabetic complications.

6-Halo-1,2,3,4-tetrahydr

Novel thiazolylacetic acid derivative of the formula: ##STR1## wherein R.sup.1.sub.N H-- is amino or a protected amino group, R.sup.2 is hydrogen or lower alkyl, --COOR.sup.3 is carboxy or a protected carboxy group and n is an integer of 2 or 3, and processes for preparing the same. The compound (I) is useful as an intermediate in the synthesis of cephalosporins.

Thiazolylacetic acid derivative and processes for preparing the same

Novel quinazolinone compounds of the formula: ##STR1## wherein R is hydrogen atom or a lower alkyl, R.sup.1 is a lower alkyl, a substituted or unsubstituted phenyl or an aralkyl, and R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are the same or different and are each hydrogen atom, a halogen atom, a lower alkyl, a lower alkoxy, a lower alkoxycarbonyl or a lower alkoxycarbonyl-lower alkenyl, or two adjacent groups of R.sup.2,R.sup.3, R.sup.4 and R.sup.5 when taken together form methylenedioxy and the other two are hydrogen atom, and a salt thereof, which are useful for the prophylaxis and treatment of various diabetic complications, and processes for the preparation thereof, and a pharmaceutical composition containing said compound as an active ingredient.

Quinazolinone copmpounds useful for the prophyloxis and treatment of

A cephalosporin compound of the formula: ##STR1## wherein R.sup.1 is hydrogen or lower alkyl;

Cephalosporin compounds

A quinazolinone derivative of the formula: ##STR1## wherein R is lower alkyl, lower alkoxy or halogen. Said quinazolinone derivative (I) or a pharmaceutically acceptable acid addition salt thereof is useful as central muscle relaxants.

Quinazolinone derivative

Thiazole intermediates for cephalosporin compounds

A 7.beta.-{(Z)-2-(2-aminothiazol-4-yl)-2-[(2-pyrrolidon-3-yl)oxyimino]acetam ido}-3-(1-amino-1H-tetrazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid or a pharmaceutically acceptable salt thereof is useful as an antimicrobial agent.

Pyrrolidomoxine cephalosporins

N-(2-amino-5-nitrobenzoyl)-o-toluidine is condensed with fluoroacetic acid or a functional derivative thereof. N-(2-fluoroacetamido-5-nitrobenzoyl)-o-toluidine obtained by said condensation reaction is dehydrated to produce 2-fluoromethyl-3-(o-tolyl)-6-nitro-4(3H)-quniazolinone, which is then subjected to reduction reaction. 2-fluoromethyl-3-(o-tolyl)-6-amino-4(3H)-quinazolinone thus obtained and a pharmaceutically acceptable acid addition salt thereof are useful as central muscle relaxants, minor tranquilizers, anti-convulsants, analgesics and/or anti-inflammatory agents.

2-Fluoromethyl-3-o-tolyl-6-amino-4(3H)-quinazolinone

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Kyoto, Japan

Yoshihisa Yamada