Ckd Corporation

Kabushiki Kaisha Toshiba

Yoshihisa Sudo

Kenichi Goshima

Katsuya Okumura

Akihiro Kojima

Hiroshi Itafuji

Minoru Ito

A purge system has a purge gas piping system for substituting inert gas for process gas when a device connected in a process gas piping system is detached therefrom. In the purge system, a purge joint for connecting two pipes in the purge gas piping system is provided with an opening formed in alignment with the position where the two pipes are connected in the purge joint.

Purge system and purge joint

In a flow quantity test system for a mass flow controller, a gas source for measurement is provided to supply gas for measurement. A cutoff valve for start of measurement is connected at its inlet port to the gas source for measurement and is connected at its outlet port to an inlet port of the mass flow controller. The cutoff valve for start of measurement is opened to flow the gas for measurement therethrough and closed to block the flow of the gas for measurement therethrough. A pressure gauge is provided to detect pressure of the gas for measurement appearing at the outlet port side of the cutoff valve for start of measurement. A microcomputer is provided to close the process gas cutoff valve and open the cutoff valve for start of measurement to change pressure detected by the pressure gauge. The microcomputer further closes the cutoff valve for start of measurement after pressure detected by the pressure gauge has reached predetermined pressure and measures lowering of pressure detected by the pressure gauge dependent on lapse of time after closing of the cutoff valve for start of measurement. Thereafter the microcomputer tests measuring precision of the mass flow controller in accordance with the measured lowering of the detected pressure.

Flow quantity test system for mass flow controller

A gas supplying system for supplying a corrosive gas or the like to a semiconductor manufacturing apparatus or the like. A plurality of kinds of component gases are introduced into a chamber and mixed therein to form a desired supply gas. After supplying the desired supply gas, the chamber is evacuated and an inert gas is charged into the chamber to substitute a residual supply gas remaining in the chamber by the inert gas. The evacuation of the chamber and the charging of the inert gas into the chamber are repeated two or more times. Accordingly, the residual supply gas can be efficiently removed from the chamber and substituted by the inert gas.

Growing community of inventors

Tokyo, Japan

Yoshihisa Sudo